journal article·2012-04

Surface texture modification of spin-coated SiO2 xerogel thin films by TMCS silylation

YOGESH S MHAISAGAR, BHAVANA N JOSHI, A M MAHAJAN

Bulletin of Materials Science· Volume 35· Issue 2
Publisher page

Abstract

The SiO2 xerogel thin films were deposited successfully by sol–gel technique via the acid-catalyzed hydrolysis and condensation of tetraethylorthosilicate (TEOS) with ethanol as a solvent. Further, the deposited thin films were treated wet chemically by trimethylchlorosilane (TMCS) and hexane solution with 10% and 15% volume ratio to remove the hydroxyl groups from the surface of deposited SiO2 thin films. These as deposited and surface-modified films were characterized by ellipsometer, Fourier transform infrared (FTIR) spectrometer and contact angle meter. The presence of 2900 and 850 cm−1 peaks of CH3 vibrations in FTIR spectra of surface-modified films confirms the hydrphobisation of SiO2 surface. The maximum contact angle of 108·7° was observed for the surface-modified film at 10% TMCS.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Aerogels and thermal insulation · Mesoporous Materials and Catalysis · Surface Modification and Superhydrophobicity

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (13)

Show source-provided references
1. Aksenov G et al 2009 Mater. Res. Soc. Symp. Proc. 115610.1557/PROC-1156-D02-08 ↗
2. Aravind P R, Shajesh P, Soraru G D and Warrier K G K 2010 J. Sol–Gel Sci. Technol. 54 10510.1007/s10971-010-2164-2 ↗
3. Brinker C J and Scherrer G W 1990 Sol–gel science and technology (Academic Press)
4. Gurav J L, Rao A V and Nadargi D 2009 J. Sol–Gel Sci. Technol. 50 27510.1007/s10971-009-1938-x ↗
5. Gurav J L, Jung I-K, Park H-H, Kang E S and Nadargi D Y 2010 J. Nanomater. Article ID 40931010.1155/2010/409310 ↗
6. Joshi B N, Mhaisagar Y S and Mahajan A M 2010 J. Optoelectr. Adv. Mater.—Rapid Commun. 4 1304
7. Lijiu W and Shanyu Z 2009 J. Wuhan Univ. Technol.—Mater. Sci. 24 61310.1007/s11595-009-4613-8 ↗
8. Liu J, Zhang L, Yang Q and Li C 2008 Micropor. Mesopor. Mater. 116 33010.1016/j.micromeso.2008.04.030 ↗
9. Naik B and Ghosh N N 2009 Recent Pat. Nanotechnol. 3 21310.2174/187221009789177768 ↗
10. Orozco-Teran R A, Gorman B P, Mueller D W, Baklanov M R and Reidy R F 2005 Thin Solid Films 471 14510.1016/j.tsf.2004.05.005 ↗
11. Park Y-B, Rhee S-W, Imaizumi Y and Urisu T 1996 J. Appl. Phys. 80 123610.1063/1.362861 ↗
12. Rao A P and Rao A V 2010 J. Mater. Sci. 45 5110.1007/s10853-009-3888-7 ↗
13. Zhou X C, Zhong L P and Xu Y P 2008 Inorg. Mater. 44 97610.1134/S0020168508090148 ↗