journal article·2006-04

Structural and electrical properties of swift heavy ion beam irradiated Co/Si interface

Garima Agarwal, Ankur Jain, Shivani Agarwal, D. Kabiraj, I. P. Jain

Bulletin of Materials Science· Volume 29· Issue 2
Publisher page

Abstract

Synthesis of swift heavy ion induced metal silicide is a new advancement in materials science research. We have investigated the mixing at Co/Si interface by swift heavy ion beam induced irradiation in the electronic stopping power regime. Irradiations were undertaken at room temperature using 120 MeV Au ions at the Co/Si interface for investigation of ion beam mixing at various doses: 8 × 1012, 5 × 1013 and 1 × 1014 cm−2. Formation of different phases of cobalt silicide is identified by the grazing incidence X-ray diffraction (GIXRD) technique, which shows enhancement of intermixing and silicide formation as a result of irradiation.I–V characteristics at Co/Si interface were undertaken to understand the irradiation effect on conduction mechanism at the interface.
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Research context

OpenAlex topics: Semiconductor materials and interfaces · Ion-surface interactions and analysis · Integrated Circuits and Semiconductor Failure Analysis

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References (15)

Show source-provided references
1. Assmann W, Dobler M, Avasthi D K, Kruijer S, Mieskes H D and Nolte H 1998Nucl. Instrum. Meth. Phys. Res. B146 27110.1016/S0168-583X(98)00504-7 ↗
2. Bolse W and Schattat B 2002Nucl. Instrum. Meth. Phys. Res. B190 17310.1016/S0168-583X(01)01225-3 ↗
3. Chaudhary S, Biswas S, Gupta A, Avasthi D K, Bhattacharyya D, Teichert S and Sarkar D K 2004Nucl. Instrum. Meth. Phys. Res. B217 58910.1016/j.nimb.2003.12.020 ↗
4. Dhar S, Schaaf P, Lieb K P, Bibic N, Milosavljevic M, Sajavaara T, Keinonen J and Traverse A 2003Nucl. Instrum. Meth. Phys. Res. B205 74110.1016/S0168-583X(03)00578-0 ↗
5. Diva K, Kabiraj D, Chakraborty B R, Shivaprasad S M and Avasthi D K 2004Nucl. Instrum. Meth. Phys. Res. B222 16910.1016/j.nimb.2004.01.221 ↗
6. Dufour C, Bauer Ph, Marchal G and Jousset J C 1993Europhysics Lett. 21 67110.1209/0295-5075/21/6/007 ↗
7. Gambino J P and Colgan E G 1998Mater. Chem. Phys. 52 9910.1016/S0254-0584(98)80014-X ↗
8. Kim G B, Kwak J S and Baik H K 1997J. Appl. Phys. 82 232310.1063/1.366040 ↗
9. Kraft S, Schattat B and Bolse W 2002J. Appl. Phys. 91 112910.1063/1.1425439 ↗
10. Masoud N M, Arafah D E and Beeker K H 2002Nucl. Instrum. Meth. Phys. Res. B198 6410.1016/S0168-583X(02)01515-X ↗
11. Milosavljevic M, Shao G, Bibic N, McKinty C N, Javnes C and Homewood K P 2002Nucl. Instrum. Meth. Phys. Res. B188 16610.1016/S0168-583X(01)01068-0 ↗
12. Murarka S P 1983Silicides for VLSI applications (New York: Academic Press)
13. Wang Z G, Dufour C, Paumier E and Toulemonde M 1994J. Phys. Condens. Matter 6 673310.1088/0953-8984/6/34/006 ↗
14. Yang Z, Homewood K P, Finney M S, Harry M A and Reeson K J 1995J. Appl. Phys. 78 195810.1063/1.360167 ↗
15. Zeigler J F, Biersack J P and Littmark U 1985The stopping and ranges of ions in solids (New York: Pergamon)