Effect of nitrogen flow ratio on structure and properties of zirconium nitride films on Si(100) prepared by ion beam sputtering
Source abstract
Abstract
In this study, zirconium nitride thin films were deposited on Si substrates by ion beam sputtering (IBS). Influence of N2/(N2+Ar) on the structural and physical properties of the films has been investigated with respect to the atomic ratio between nitrogen and zirconium. It was found that the thickness of layers decreased by increasing the F(N2). Moreover, crystalline plane peaks such as (111), (200) and (220) with (111) preferred orientation were observed due to strain energy which associate with (111) orientation in ZrN. Also, the fluctuation in nitrogen flow ratio results in colour and electrical resistivity of films.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · Copper Interconnects and Reliability
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References (15)
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1. Benia H M, Guemmaz M, Schmerber G, Mosser A and Parlebas J C 2002 Appl. Surf. Sci. 200 23110.1016/S0169-4332(02)00925-X ↗
2. Birkholz M 2006 Thin film analysis by X-ray scattering (Germany: Wiley-VCH)
3. Ching W Y, Xu Y N and Ouyang L 2002 Phys. Rev. B66 23510610.1103/PhysRevB.66.235106 ↗
4. Constantin S R and Miremad B 1999 Surf. Coat. Technol. 120–121 72810.1016/S0257-8972(99)00366-7 ↗
5. Greene J E, Sundgren J-E, Hultman L, Petrov I and Bergstrom D B 1995 Appl. Phys. Lett. 67 292810.1063/1.114845 ↗
6. Huang J H, Hsu C Y, Chen S S and Yu G P 2002 Mater. Chem. Phys. 77 1410.1016/S0254-0584(01)00494-1 ↗
7. Hubler R, Cozza A, Marcondes T L, Souza R B and Fiori F F 2001 Surf. Coat. Technol. 142–144 107810.1016/S0257-8972(01)01321-4 ↗
8. Larijani M M, Tabrizi N, Norouzian Sh, Jafari A, Lahoutia S and Haj Hosseini H 2006 Vacuum 81 55010.1016/j.vacuum.2006.07.018 ↗
9. Larijani M M, Norouzian Sh, Afzalzadeh R, Balashabadi P and Dibaji H 2009 Surf. Coat. Technol. 203 248610.1016/j.surfcoat.2009.02.060 ↗
10. Pelleg J, Zevin L Z and Lungo S 1991 Thin Solid Films 197 11710.1016/0040-6090(91)90225-M ↗
11. Rodriguez R J et al 2002 Vacuum 67 55910.1016/S0042-207X(02)00248-8 ↗
12. Schlegel A, Wachter P, Nickl J J and Lingg H 1977 J. Phys. C: Solid State Phys. 1010.1088/0022-3719/10/23/022 ↗
13. Streit M, Ingold F, Pouchon M, Gauckler L J and Ottaviani J-P 2003 J. Nucl. Mater. 319 5110.1016/S0022-3115(03)00133-8 ↗
14. Wasa K, Kitabatake M and Adachi H 2004 Thin films materials technology (Norwich, NY: Springer)
15. Westlinder J, Malmstrom J, Sjoblom G and Olsson J 2005 Solid-State Electron. 49 141010.1016/j.sse.2005.06.021 ↗