Characterization of nanocrystalline cadmium telluride thin films grown by successive ionic layer adsorption and reaction (SILAR) method
Source abstract
Abstract
Structural, electrical and optical characteristics of CdTe thin films prepared by a chemical depos i- tion method, successive ionic layer adsorption and reaction (SILAR), are d escribed. For deposition of CdTe thin films, cadmium acetate was used as cationic and sodium tellurite as anionic precursor in aqueous me- dium. In this process hydrazine hydrate is used as reducing agent and NH 4OH as the catalytic for the decom- position of hydrazine. By conducting several trials optimization of the a dsorption, reaction and rinsing time duration for CdTe thin film deposition was done. In this paper the structural, optical and electrical prope rties of CdTe film are reported. The XRD pattern shows that films are nanocrystalline in nature. The resi stivity is found to be of the order of 4 · ·11 × 10 3 Ω Ω-cm at 523 K temperature with an activation energy of ~ 0·2 eV. The optical absorption studies show that films have direct band gap (1 · ·41 eV).
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Research context
OpenAlex topics: Chalcogenide Semiconductor Thin Films · Quantum Dots Synthesis And Properties · Advanced Semiconductor Detectors and Materials
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References (11)
Show source-provided references
1. ASTM Diffraction Data File card No. 19-193
2. Banerjee A, Saha H and Guha R 1989Indian J. Phys. A63 326
3. Kuhaimi S A, Tulbah Z, Marhad A, Harbi F and Moneef M 2000Indian J. Pure & Appl. Phys. 38 127
4. Martin O, Fogarassy E and Fabre B 1976J. Appl. Phys. 47 26410.1063/1.322310 ↗
5. Nicolau Y F 1985Appl. Surf. Sci. 22 106110.1016/0378-5963(85)90241-7 ↗
6. Nicolau Y F and Menard J C 1988J. Cryst. Growth 92 12810.1016/0022-0248(88)90443-5 ↗
7. Nicolau Y F, Dupuy M and Bruner M 1990J. Electro-Chem. Soc. 137 291510.1149/1.2087099 ↗
8. Ou S, Bindal A, Stafusudd D and Wang K 1984J. Appl. Phys. 55 102010.1063/1.333194 ↗
9. Padam G K and Malhotra G L 1989Mater. Res. Bull. 24 59510.1016/0025-5408(89)90107-4 ↗
10. Patil V B and Bhosale C H 2001Thin Solid films 401 3510.1016/S0040-6090(01)01480-8 ↗
11. Ristov M, Sinadinovski G and Grozdanov I 1985Thin Solid Films 63 126