Growth of aligned carbon nanotubes on ALD-Al₂O₃coated silicon and quartz substrates

The smooth surface of the amorphous Al2O3 film on either silicon or quartz, coated by atomic layer deposition (ALD), was changed to rough surface by annealing in either air or hydrogen at high temperature (745°C) due to the formation of nanosized pinholes and micrometre pimples during the crystallisation of the amorphous Al2O3. The rough surface makes the growth of long carbon nanotubes (CNTs) by chemical vapour deposition impossible. Nevertheless, we were able to develop new catalyst recipes for successful growth of vertically aligned CNTs on ALD-Al2O3 coated silicon and quartz substrates. The lengths of the CNTs reached 90 µm on silicon substrates and 180 µm on quartz substrates. Furthermore, it is observed that the adhesion of CNTs on silicon substrates is much stronger than that on quartz substrates.