Accurate Simulation of Temperature-Dependent Dark Current in HgCdTe Infrared Detectors Assisted by Analytical Modeling
Source abstract
Abstract
Resistance–voltage curves of n+-on-p Hg1−xCdxTe infrared photodiodes were measured in the temperature range of 60 K to 120 K. Characteristics obtained experimentally were fitted by an improved simultaneous-mode nonlinear fitting process. Based on the extracted parameters, an efficient numerical sim- ulation approach has been developed by inserting trap-assisted and band-to-band tunneling models into continuity equations as generation–recombination processes. Simulated dark-current characteristics were found to be in good agreement with the experimental data, demonstrating the validity of the nonlinear fitting process. Our work presents an efficient method for dark-current simulations over a wide range of temperatures and bias voltages, which is important for investigating mechanisms of carrier transport across the HgCdTe junction.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Advanced Semiconductor Detectors and Materials · Infrared Target Detection Methodologies · Thermography and Photoacoustic Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (32)
Show source-provided references
1. P. Norton, Opto-Electron. Rev. 10, 159 (2002).
2. V. Gopal and S. Gupta, IEEE Trans. Electron. Dev. 50, 1220 (2003).10.1109/TED.2003.813230 ↗
3. A. Rogalski, Rep. Prog. Phys. 68, 2267 (2005).10.1088/0034-4885/68/10/R01 ↗
4. N.H. Jo, S.D. Yoo, B.G. Ko, S.W. Lee, J. Jang, S.D. Lee, and K.D. Kwack, SPIE 3436, 50 (1998).
5. V. Gopal, S. Gupta, R.K. Bhan, R. Pal, P.K. Chaudhary, and V. Kumar, Infrared Phys. Technol. 44, 143 (2003).10.1016/S1350-4495(02)00185-8 ↗
6. S.C. Shen, Microelectron. J. 25, 713 (1994).10.1016/0026-2692(94)90136-8 ↗
7. A. Rogaski, Infrared Phys. 28, 53 (1988).
8. V. Gopal, S.K. Singh, and R.M. Mehra, Infrared Phys. Technol. 43, 317 (2002).10.1016/S1350-4495(02)00159-7 ↗
9. A. Jozwikowska, K. Jozwikowski, J. Antoszewski, C.A. Musca, T. Nguyen, R.H. Sewell, J.M. Dell, L. Faraone, and Z. Orman, J. Appl. Phys. 98, 014504 (2005).10.1063/1.1946201 ↗
10. P.Y. Emelie, J.D. Phillips, S. Velicu, and C.H. Grein, J. Electron. Mater. 36, 846 (2007).10.1007/s11664-007-0107-7 ↗
11. D. D’Orsogna, S.P. Tobin, and E. Bellotti, J. Electron. Mater. 37, 1349 (2008).10.1007/s11664-008-0438-z ↗
12. Z.J. Quan, Z.F. Li, W.D. Hu, Z.H. Ye, X.N. Hu, and W. Lu, J. Appl. Phys. 100, 084503 (2006).10.1063/1.2358411 ↗
13. G.B. Chen, W. Lu, X.S. Chen, Z.F. Li, W.Y. Cai, L. He, X.N. Hu, and S.C. Shen, Semicond. Sci. Technol. 18, 887 (2003).10.1088/0268-1242/18/9/313 ↗
14. L. He, J.R. Yang, S.L. Wang, S.P. Guo, M.F. Yu, X.Q. Chen, W.Z. Fang, Y.M. Qiao, Q.Y. Zhang, R.J. Ding, and T.L. Xin, J. Cryst. Growth 175/176, 677 (1997).10.1016/S0022-0248(96)01001-9 ↗
15. T. Nguyen, C.A. Musca, J.M. Dell, J. Antoszewski, and L. Faraone, J. Electron. Mater. 33, 621 (2004).10.1007/s11664-004-0057-2 ↗
16. W.D. Hu, X.S. Chen, F. Yin, Z.J. Quan, Z.H. Ye, X.N. Hu, Z.F. Li, and W. Lu, J. Appl. Phys. 105, 104502 (2009).10.1063/1.3130163 ↗
17. Z.H. Ye, X.N. Hu, W.Y. Cai, G.B. Chen, Q.J. Liao, H.Y. Zhang, and L. He, J. Infrared Millimeter Waves 24, 459 (2005).
18. M.C. Chen, L. Colombo, J.A. Dodge, and J.H. Tregilgas, J. Electron. Mater. 24, 539 (1995).10.1007/BF02657960 ↗
19. H. Nishino, K. Ozaki, M. Tanaka, T. Saito, H. Ebe, and Y. Miyamoto, J. Cryst. Growth 214/215, 275 (2000).10.1016/S0022-0248(00)00088-9 ↗
20. Device simulator, Sentaurus Device (former ISE-DESSIS) Ver. A-2008. 08.
21. D. Rosenfeld and G. Bahir, IEEE Trans. Electron Devices ED39, 1638 (1992).10.1109/16.141229 ↗
22. Y. Nemirovsky, R. Fastow, M. Meyassed, and A. Unikovsky, J. Vac. Sci. Technol. B 9, 1829 (1991).10.1116/1.585808 ↗
23. D.H. Mao, H.G. Robinson, D.U. Bartholomew, and C.R. Helms, J. Electron. Mater. 26, 678 (1997).10.1007/s11664-997-0215-4 ↗
24. Y.H. Kim, S.H. Bae, H.C. Lee, and C.K. Kim, J. Electron. Mater. 29, 832 (2000).10.1007/s11664-000-0233-y ↗
25. R.J. Westerhout, C.A. Musca, J. Antoszewski, J.M. Dell, and L. Faraone, J. Electron. Mater. 36, 884 (2007).10.1007/s11664-007-0120-x ↗
26. G.M. Williams and R.E. De Wames, J. Electron. Mater. 24, 1239 (1995).10.1007/BF02653080 ↗
27. V. Dhar and V. Gopal, Opt. Eng. 39, 2022 (2000).10.1117/1.1303763 ↗
28. E. Bellotti and D. D’Orsogna, IEEE J. Quantum Electron. 42, 418 (2006).10.1109/JQE.2006.871555 ↗
29. J. Wenus, J. Rutkowski, and A. Rogalski, IEEE Trans. Electron. Dev. 48, 1326 (2001).10.1109/16.930647 ↗
30. K. Jozwikowski and A. Rogalski, J. Appl. Phys. 98, 014504 (2005).10.1063/1.1946201 ↗
31. J.M. Dell, J. Antoszewski, M.H. Rais, C.A. Musca, B.D. Nener, and L. Faraone, J. Electron. Mater. 29, 841 (2000).10.1007/s11664-000-0235-9 ↗
32. T. Nguyen, C.A. Musca, J.M. Dell, J. Antoszewski, and L. Faraone, J. Electron. Mater. 32, 615 (2003).10.1007/s11664-003-0041-2 ↗