An investigation of microcrystalline films produced by a dc glow discharge in silane and hydrogen
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Abstract
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies
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References (12)
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5. B. Chapman, “Glow Discharge Processes: Sputtering and Plasma Etching,” Wiley, N.Y. c.1980.
6. D. E. Carlson and C. W. Magee, 2nd E. C. Photovoltaic Solar Energy Conf., Berlin, 23–26 April, 1979. De Reidel Publ. Co., Dordrecht, Holland.
7. D. E. Carlson, R. W. Smith, C. W. Magee and P. J. Zanzucchi, Philos. Mag.B45, 51 (1982).10.1080/13642818208246388 ↗
8. V. L. Dalai, M. Fortmann, and E. Eser, “Tetrahedrally Bonded Amorphous Semiconductors,” Editors, R. A. Street, D. K. Biegelsen and J. C. Knights, AIP, N.Y. 1981, p. 15.
9. G. A. Swartz and J. T. McGinn, private communication.
10. Y. Mishima, T. Hamasaki, H. Kurata, M. Hirose and Y. Osaka, Jap. J.Appl.Phys.20, L121 (1981).10.1143/JJAP.20.L121 ↗
11. S. Yamasaki, T. Hata, T. Yoshida, H. Oheda, A. Matsuda, H. Okushi and K. Tanaka, 9th Int’l. Conf. on Amorphous and Liquid Semicond., Grenoble, France, July 2–8, 1981.
12. S. Matsuda, M. Matsumura, K. Nakagawa, T. Imura, H. Yamamoto, S. Yamasaki, H. Okushi, L. Iizima and K. Tanaka, “Tetrahedrally Bonded Amorphous Semiconductors,” Editors, R. A. Street, D. K. Biegelsen and J. C. Knights, AIP, NY 1981.