Thermodynamics equilibrium analysis on the chemical vapor deposition of HfC as coatings for ceramic matrix composites with HfClx(x = 2–4)-CyHz(CH4, C2H4 and C3H6)-H2-Ar system
Source abstract
Abstract
A detailed thermodynamic equilibrium analysis in the chemical vapor deposition of HfC as coatings for ceramic matrix composites with HfClx(x = 2–4)-CyHz(CH4, C2H4 and C3H6)-H2-Ar system has been investigated using the FactSage code. To protect the excellent performance of the composites, we demand a suitable composition and yield of condensed phases. They have been examined as functions of the inject reactant ratios of HfClx/(HfClx + CyHz) and H2/(HfClx + CyHz), temperatures, and pressures. The results show that the HfCl4 species are the optimal Hf-source in the deposition process. The ideal ratio parameters for production of single phase HfC are Log[H2/(HfCl4 + CyHz)] = 2 and Hf/C = 1. And the optimum temperature condition is above 1200 K. A lower pressure of 5 kPa is found to be more favorable for the deposition of a pure HfC phase. The co-deposition of HfC with C or Hf will be easily obtained by only controlling the ratios of HfCl4/(HfCl4 + CyHz) and H2/(HfCl4 + CyHz). The HfCl4-C3H6-H2 precursor system should be the best choice in the experiment due to a higher yield of HfC at the same deposition conditions. The results in this work will be helpful for the further experiment investigation under different deposition conditions and put forward a new idea in exploration of the preparation method of coatings for ceramic matrix composites.
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Research context
OpenAlex topics: Advanced ceramic materials synthesis · Advanced materials and composites · Aluminum Alloys Composites Properties
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