DataVXJournal of Electronic MaterialsPaper
journal article·1990-10

Defect microstructure in single crystal silicon thin films grown at 150° C-305° C by remote plasma-enhanced chemical vapor deposition

T. Hsu, B. Anthony, L. Breaux, R. Qian, S. Banerjee, A. Tasch, C. Magee, W. Harrington

Journal of Electronic Materials· Volume 19· Issue 10
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Abstract

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Research context

Materials processing

OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies

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References (19)

Show source-provided references
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