journal article·1997-11

Gallium arsenide surface chemistry and surface damage in a chlorine high density plasma etch process

C. R. Eddy, O. J. Glembocki, D. Leonhardt, V. A. Shamamian, R. T. Holm, B. D. Thoms, J. E. Butler, S. W. Pang

Journal of Electronic Materials· Volume 26· Issue 11
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Abstract

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Research context

OpenAlex topics: Semiconductor materials and devices · Plasma Diagnostics and Applications · Metal and Thin Film Mechanics

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References (16)

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9. R.T. Holm, to be published.
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14. O.J. Glembocki, J.A. Dagata, E.A. Dobisz and D.S. Katzer, Photons and Low Energy Particles in Surface Processing, ed. C.I.H. Ashby, J.H. Brannon and S.W. Pang, 236, (Pittsburgh, PA: Materials Research Society, 1992), p. 217.
15. O.J. Glembocki, K.K. Ko, E.W. Berg, S.W. Pang and C.E. Stutz, to be published.
16. C.R. Eddy, Jr., D. Leonhardt, S.R. Douglass, B.D. Thoms and J.E. Butler, to be published.