journal article·1997-09

Electromigration in aluminum/silicon/copper metallization due to the presence of a thin oxide layer

K.A. Koh, S.J. Chua

Journal of Electronic Materials· Volume 26· Issue 9
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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Copper Interconnects and Reliability · Electronic Packaging and Soldering Technologies · Corrosion Behavior and Inhibition

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (12)

Show source-provided references
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