journal article·1984-11

Characteristics of thermally nitrided silicon dioxide film and plasma enhancement

I. Kato, T. Ito, T. Nakamura, H. Ishikawa

Journal of Electronic Materials· Volume 13· Issue 6
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Abstract

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Research context

OpenAlex topics: Semiconductor materials and devices · Semiconductor materials and interfaces · Thin-Film Transistor Technologies

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References (11)

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