journal article·1987-07

Microstructure and properties of multilayer-derived tungsten silicide

Bi-Shiou Chiou, H. L. Rau, P. H. Chang, J. G. Duh

Journal of Electronic Materials· Volume 16· Issue 4
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Abstract

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Research context

OpenAlex topics: Semiconductor materials and interfaces · Intermetallics and Advanced Alloy Properties · Surface and Thin Film Phenomena

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References (11)

Show source-provided references
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4. S. P. Murarka, M. H. Read, C. J. Doherty, and D. B. Fraser, J. Electrochem. Soc.129, 293 (1982).10.1149/1.2123815 ↗
5. D. L. Brors, J. A. Fair, K. A. Monnig, and K. C. Saraswat, Solid State Technol.26, 183 (1983).
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9. S. P. Murarka, M. H. Read, and C. C. Chang, J. Appl. Phys.52, 172 (1981).10.1063/1.328741 ↗
10. M. Y. Tsai, F. M. d’Heurle, C. S. Petersson, and R. W. Johnson, J. Appl. Phys.52, 5350 (1981).10.1063/1.329393 ↗
11. M.-A., Nicolet and S. S. Lau, in “VLSI Electronics, Microstructure Science,” Ed. by N. G. Einspruch and G. B. Larrabee, Academic Press, Inc., New York, U.S.A. 330, (1983).