journal article·1989-11

The role of interfacial segregation and microstructure in interdiffusion between aluminum and silicon

David C. Eng, Nicole Herbots, Olof C. Hellman, Olivier Vancauwenberghe, Shahrnaz Motakef, Robert J. Culbertson

Journal of Electronic Materials· Volume 18· Issue 6
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Silicon and Solar Cell Technologies · Semiconductor materials and interfaces · Integrated Circuits and Semiconductor Failure Analysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (4)

Show source-provided references
1. A. J. Learn and R. S. Nowicki, Appl. Phys. Lett.35, 611 (1979).10.1063/1.91226 ↗
2. N. Herbots, F. van De Wiele, R. G. Elliman, and M. Lobet, J. Electrochem. Soc. 131, 645 (1984).10.1149/1.2115650 ↗
3. N. Herbots, M. Lobet, and F.vanDe Wiele, Nucl. Instrum. Methods B7/8, 278 (1985).10.1016/0168-583X(85)90566-X ↗
4. J. L. Tandon, H. B. Harrison, C. L. Neoh, K. T. Short and J. S. Williams Appl. Phys. Lett.40, 228 (1982).10.1063/1.93055 ↗