Electron beam lithographic techniques and electrochemical reactions for the micro- and nanostructuring of surfaces under extreme conditions
Source abstract
Abstract
An overview of nanostructuring of surfaces using electron-beam lithographic approaches combined with electrochemical techniques is given. We report the compatibility of conventional electron-beam lithography as well as an alternative method (electron-beam-induced deposition) with electroplating of metals and electrochemical etching of the substrates. This paper describes how to exploit these electron beam-writing techniques for highly selective electrochemical reactions at various surfaces. The ability to use electron beam-induced nanomasking even under extreme conditions is highlighted for the fabrication of structures in the sub-100 nm range.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Integrated Circuits and Semiconductor Failure Analysis · Advanced Electron Microscopy Techniques and Applications
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