Fine patterning of ceramic thick layer on aerosol deposition by lift-off process using photoresist
Source abstract
Abstract
Ceramic fine patterning using aerosol deposition (AD) method and lift-off process was reported. Pre-baking conditions and thickness of photoresist layer were selected carefully to minimize the dimensions of the patterned structure. As a result, a pattern width less than 10 µm for 2 µm thick PZT and α-Al2O3 AD-deposited layers was obtained on Si substrate at room temperature.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Ferroelectric and Piezoelectric Materials · Advanced ceramic materials synthesis · Acoustic Wave Resonator Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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