The C2H2 gas effect on the growth behavior of remote plasma enhanced CVD SiC:H film
Source abstract
Abstract
SiC:H films were produced in a remote plasma enhanced chemical vapor deposition (RPE-CVD) system. The HMDS was chosen as the primary source gas and was fixed at constant flow rate of 10 sccm. The C2H2 gas input amount was varied from 3 to 200 sccm for the study of carbon effect on the film stoichiometry and bonding properties. The deposition temperature of the substrate was fixed at 400∘C, and the plasma power was fixed at 300 W. Using auger electron spectroscopy, the depth profile of the film was investigated with C2H2 flow rate changes. The C2H2 played an important role in the transition between sp2 and sp3 carbon hybridization bonds, which affected the growth behavior and properties of the films.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Copper Interconnects and Reliability · Silicon Carbide Semiconductor Technologies · Plasma Diagnostics and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (13)
Show source-provided references
1. O. Louveau, D. Louis, M. Assous, R. Blanc, P. Brun, S. Lamy, and E. Lajoinie, Microelectron. Eng., 61–62, 867 (2002).10.1016/S0167-9317(02)00486-0 ↗
2. L. Peters, Semicond. Int., 21, 64 (1998).
3. Y. Uchida, K. Taguchi, S. Sugahara, and M. Matsumura. Jpn. J. Appl. Phys., 38, 2368 (1999).10.1143/JJAP.38.2368 ↗
4. Y.H. Kim, S.K. Lee, and H.J. Kim, J. Vac. Sci. Technol. A, 18(4), 1216 (2000).10.1116/1.582328 ↗
5. A.F. Flannery, N.J. Mourlas, C.W. Storment, S. Tsai, S.H. Tan, J. Heck, D. Monk, T. Kim, B. Gogoi, and G.T.A. Kovacs, Sensors and Actuators A, 70, 48 (1998).10.1016/S0924-4247(98)00111-3 ↗
6. A.M. Wróbel, S. Wickramanayaka, K. Kitamura, Y. Nakanishi, and Y. Hatanaka, Chemical Vapor Deposition, 6, 315 (2000).10.1002/1521-3862(200011)6:6<315::AID-CVDE315>3.0.CO;2-7 ↗
7. A.M. Wróbel, A. Walkiewicz-Pietrzykowska, J.E. Klemberg-Sapieha, Y. Hanaka, T. Aoki, and Y. Nakanishi, J. Appl. Polym. Sci., 86, 1445 (2002).10.1002/app.11304 ↗
8. J. Chastain, Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer Corporation Physical Eclectronic Division, 1992.
9. K. Sato, S.H. Cheng, H. Haruta, T. Yokoyama, and Y. Kumashiro, Jpn. J. Appl. Phys., 39, 2843 (2000).10.1143/JJAP.39.2843 ↗
10. S.H. Cheng, K. Sato, and Y. Kumashiro, J. Appl. Phys., 87, 4031 (2000).10.1063/1.372450 ↗
11. M. Tsuji, H. Kouno, K. Matsumura, T. Funatsu, and Y. Nishimura, J. Chem. Phys., 98, 2011 (1993).10.1063/1.464234 ↗
12. J.W.A.M. Gielen, M.C.M. van de Sanden, and D.C. Schram, Appl. Phys. Lett., 69(2), 152 (1996).10.1063/1.116904 ↗
13. J. Benedik, M. Wisse, R.V. Woen, R. Engeln, and M.C.M. van de Sanden, J. Appl. Phys., 94, 6932 (2003).10.1063/1.1622116 ↗