journal article·1993-02

The effect of temperature on the epitaxial quality of bilayers of iridium silicide and SiGe deposited on Si(100) in ultrahigh vacuum

C.K. Chung, J. Hwang, Y.H. Chang, W.J. Chen, L.P. Wang

Journal of Crystal Growth· Volume 126· Issue 4
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Abstract

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Research context

OpenAlex topics: Semiconductor materials and interfaces · Surface and Thin Film Phenomena · Semiconductor materials and devices

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References (15)

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