journal article·2002-09

Control of GaN surface morphologies grown on 6H-SiC (0001) using plasma-assisted molecular beam epitaxy

K. Jeganathan, M. Shimuzu, T. Ide, H. Okumura

Journal of Crystal Growth· Volume 244· Issue 1
Publisher page

Abstract

Abstract We report the structural and surface morphologies of GaN layer directly grown on 6H-SiC (0 0 0 1) substrates by plasma-assisted molecular beam epitaxy. The structural properties of the GaN layers grown under Ga-rich conditions have been strongly influenced by the surface oxide-desorption through Ga-metal deposition and flash-off at high temperature. The resulting AFM surface morphology exhibits atomic steps with
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Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Silicon Carbide Semiconductor Technologies · Ga2O3 and related materials

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References (14)

Show source-provided references
1. Schetzina · Mater. Res. Soc. Symp. Proc. · 1996 · 395 · 12310.1557/PROC-395-123 ↗
2. Yang · Appl. Phys. Lett. · 1998 · 73 · 386910.1063/1.122920 ↗
3. R. Lantier, A. Rizzi, D. Guggi, B. Neubauer, D. Gerthsen, S. Frabboni, G. Coli, R. Cingolani, MRS Internet J. Nitride Semicond. Res. 4S1 (1999) G3.50.10.1557/S1092578300002647 ↗
4. Ploog · J. Vac. Sci. Technol. B · 2000 · 18 · 229010.1116/1.1305288 ↗
5. Ramachandran · J. Vac. Sci. Technol. B · 2000 · 18 · 191510.1116/1.582445 ↗
6. Owman · J. Crystal Growth · 1996 · 167 · 39110.1016/0022-0248(96)00296-5 ↗
7. Nakamura · Appl. Phys. Lett. · 2000 · 76 · 341210.1063/1.126663 ↗
8. Torres · Appl. Phys. Lett. · 1999 · 74 · 98510.1063/1.123431 ↗
9. Ramachandarn · J. Electr. Mater. · 1998 · 27 · 30810.1007/s11664-998-0406-7 ↗
10. Kaplan · Surf. Sci. · 1986 · 165 · L4510.1016/0039-6028(86)90799-5 ↗
11. Kaplan · Surf. Sci. · 1989 · 215 · 11110.1016/0039-6028(89)90704-8 ↗
12. Zyweitz · Appl. Phys. Lett. · 1998 · 73 · 48710.1063/1.121909 ↗
13. B. Heying, R. Averbeck, L.F. Chen, E. Haus, H. Riechert, J.S. Speck 88 (2000) 1855.
14. Lahreche · J. Appl. Phys. · 2000 · 87 · 57710.1063/1.371902 ↗