journal article·1990-06

Studies of metal-induced surface defects in czochralski Si following rapid thermal processing with thermal wave method

S. Hahn, W.L. Smith, H. Suga, R. Meinecke, R.R. Kola, G.A. Rozgonyi

Journal of Crystal Growth· Volume 103· Issue 1-4
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Abstract

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Research context

OpenAlex topics: Semiconductor materials and interfaces · Force Microscopy Techniques and Applications · Silicon and Solar Cell Technologies

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References (21)

Show source-provided references
1. Oehrlein · Appl. Phys. Letters · 1984 · 45 · 41710.1063/1.95242 ↗
2. Sedgwick · 1984 · Vol. 84-7 · 192
3. Hodgson · Mater. Res. Soc. Symp. Proc. · 1984 · 23 · 25310.1557/PROC-23-253 ↗
4. Okamoto · J. Appl. Phys. · 1985 · 57 · 525110.1063/1.335265 ↗
5. Rosser · Mater. Res. Soc. Symp. Proc. · 1985 · 35 · 45710.1557/PROC-35-457 ↗
6. Kato · J. Electrochem. Soc. · 1984 · 131 · 114510.1149/1.2115768 ↗
7. Sparks · J. Electrochem. Soc. · 1986 · 133 · 120110.1149/1.2108819 ↗
8. Sparks · Appl. Phys. Letters · 1986 · 49 · 52510.1063/1.97100 ↗
9. Zagozdzon-Wosik · J. Electrochem. Soc. · 1988 · 135 · 206510.1149/1.2096210 ↗
10. Silicon Device Processing
11. Lang · J. Appl. Phys. · 1974 · 45 · 302310.1063/1.1663719 ↗
12. Schulz · Appl. Phys. · 1989 · 18 · 16910.1007/BF00934412 ↗
13. Aggregation Phenomena of Point Defects in Silicon
14. Semiconductor Silicon 1981
15. Semiconductor Silicon 1981
16. Witkowski · Appl. Phys. Letters · 1988 · 52 · 64010.1063/1.99390 ↗
17. Rosencwaig · Appl. Phys. Letters · 1985 · 46 · 101310.1063/1.95794 ↗
18. Opsal · Appl. Phys. Letters · 1985 · 47 · 49810.1063/1.96105 ↗
19. Thermal Wave Imager Systems are products of Therma-Wave, Inc., Fremont, CA, USA.
20. Defects in Silicon
21. Das · J. Appl. Phys. · 1973 · 44 · 445910.1063/1.1661982 ↗