journal article·2000-12

Properties of GaN-based laser diodes with a buried-ridge structure

Tsunenori Asatsuma, Hiroshi Nakajima, Shigeki Hashimoto, Takashi Yamaguchi, Hiroshi Yoshida, Shigetaka Tomiya, Takeharu Asano, Tomonori Hino, Masafumi Ozawa, Takao Miyajima, Toshimasa Kobayashi, Masao Ikeda

Journal of Crystal Growth· Volume 221· Issue 1-4
Publisher page

Abstract

Abstract The buried-ridge structure was introduced to GaN-based laser diodes for the purpose of realizing an index-guided structure in order to control the difference of effective refractive indexes between the inside and outside of the lasing area and to stabilize the lasing mode. Low-temperature-grown Al x Ga (1− x ) N was used as the burying layer, and it was found that the refractive-index difference can be controlled by adjusting the Al content in the Al x Ga (1− x ) N burying layer independent of the ridge dimensions. As a result of fabricating LDs with different Al contents, we found that Al content should be more than 30% in order to form an index-guided structure. The optimum refractive-index difference was estimated by fitting with the calculation. The LD with a buried-ridge structure, in which Al in the burying layer was more than 30%, had desirable properties as an index-guided waveguide.
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Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Semiconductor Quantum Structures and Devices · Semiconductor Lasers and Optical Devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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