High quality GaN film growth on AlN buffer layer, pretreated with alternating pulsative supply of TMG and NH3
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OpenAlex topics: GaN-based semiconductor devices and materials · Semiconductor materials and devices · Ga2O3 and related materials
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References (34)
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1. Nakamura · Appl. Phys. Lett. · 1996 · 69 · 303410.1063/1.116830 ↗
2. Kahn · Appl. Phys. Lett. · 1992 · 60 · 291710.1063/1.106819 ↗
3. Guha · Appl. Phys. Lett. · 1993 · 63 · 302310.1063/1.110246 ↗
4. Lester · Appl. Phys. Lett. · 1995 · 66 · 124910.1063/1.113252 ↗
5. Rosner · Appl. Phys. Lett. · 1997 · 70 · 42010.1063/1.118322 ↗
6. Sugahara · Jpn. J. Appl. Phys. · 1998 · 37 · L39810.1143/JJAP.37.L398 ↗
7. Sugiura · J. Appl. Phys. · 1997 · 81 · 163310.1063/1.364018 ↗
8. Qian · Appl. Phys. Lett. · 1995 · 66 · 125210.1063/1.113253 ↗
9. Sasaki · J. Appl. Phys · 1988 · 64 · 453110.1063/1.341281 ↗
10. Ponce · Appl. Phys. Lett. · 1995 · 67 · 41010.1063/1.114645 ↗
11. Tanaka · J. Crystal Growth · 1997 · 170 · 32910.1016/S0022-0248(96)00611-2 ↗
12. Hwang · Bull. Kor. Chem. Soc. · 1997 · 18 · 1133
13. M. Hata, T. Kunisato, T. Kano, Y. Matsushita, J.S. Ito, Y. Ueda, K. Yagi, A. Ibaraki, The Japan Society of Applied Physics and Related Societies, The 44th Fall Meeting, Abstracts, 1996, p. 302.
14. A.A. Chernov (with contributions by E.I. Givargizov, K.S. Bagdasaranov, V.A. Kuznetsov, L.N. Demianets, A.N. Lobachev), Modern Crystallography III – Crystal Growth, Springer, Berlin, 1984.
15. Anderson · J. Chem. Phys. · 1974 · 60 · 427110.1063/1.1680898 ↗
16. Anderson · J. Chem. Phys. · 1974 · 60 · 247710.1063/1.1681386 ↗
17. Anderson · Int. J. Quantum. Chem. · 1994 · 49 · 58110.1002/qua.560490504 ↗
18. Anderson · J. Mol. Catal. · 1989 · 54 · 28110.1016/0304-5102(89)80146-4 ↗
19. Lotz · J. Opt. Soc. Am. · 1970 · 60 · 20610.1364/JOSA.60.000206 ↗
20. Clementi · J. Chem. Phys. · 1963 · 38 · 268610.1063/1.1733573 ↗
21. Awad · Surf. Sci. · 1989 · 218 · 54310.1016/0039-6028(89)90167-2 ↗
22. Anderson · J. Electrochem. Soc. · 1996 · 143 · 207510.1149/1.1836952 ↗
23. Chiang · Chem. Phys. Lett. · 1995 · 246 · 27510.1016/0009-2614(95)01123-Q ↗
24. Langer Stedt · J. Appl. Phys. · 1974 · 45 · 226610.1063/1.1663574 ↗
25. Chung · J. Appl. Phys. · 1992 · 72 · 65110.1063/1.351848 ↗
26. Khan · Solid State Commun. · 1986 · 57 · 40510.1016/0038-1098(86)90479-5 ↗
27. Dingle · Phys. Rev. B · 1971 · 4 · 121110.1103/PhysRevB.4.1211 ↗
28. Fisher · Appl. Phys. Lett. · 1995 · 67 · 129810.1063/1.114403 ↗
29. Kim · Chem. Mater. · 1994 · 6 · 27810.1021/cm00039a005 ↗
30. Yates · Appl. Surf. Sci. · 1994 · 82/83 · 18010.1016/0169-4332(94)90215-1 ↗
31. Unpublished results.
32. Wang · J. Appl. Phys. · 1994 · 76 · 350210.1063/1.357479 ↗
33. M.J. Almond, M.G.B. Drew, C.E. Jenkins, D.A. Rice, J. Chem. Soc. Dalton Trans. (1992) 5.10.1039/dt9920000005 ↗
34. Hwang · Chem. Mater. · 1995 · 7 · 51710.1021/cm00051a012 ↗