Direct Metal‐Free Chemical Vapor Deposition of Graphene Films on Insulating Substrates for Micro‐Supercapacitors with High Volumetric Capacitance
Source abstract
Abstract
Abstract Invited for this month's cover picture is the group of Prof. Dr. Klaus Müllen. The cover picture shows the direct metal‐free chemical vapor deposition of graphene films on insulating substrates and their integration into high‐volumetric capacitive micro‐supercapacitors. Read the full text of the Article at 10.1002/batt.201900087
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Research context
OpenAlex topics: Supercapacitor Materials and Fabrication · Graphene research and applications
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Affiliations
Max Planck Institute for Polymer Research Ackermannweg 10 55128 Mainz Germany
Organic and Carbon Nanomaterials Unit Okinawa Institute of Science and Technology Graduate University 1919-1 Tancha, Onna-son Kunigami, Okinawa 904-0495 Japan
Institute of Physical Chemistry Johannes Gutenberg-University Mainz Duesbergweg 10–14 55128 Mainz Germany
References
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