Reliability of anodic vacuum arc in depositing thermoelectric alloy thin films
Source abstract
Abstract
Abstract Inductively coupled plasma optical emission spectrometry (ICP-OES) was applied for the analysis of major and minor elements of thermoelectric alloys (Constantan, Chromel and Alumel) and their thin films deposited using anodic vacuum arc (AVA) plasma deposition technique. Digestion of samples was done in aqua regia. The minor and trace elements were determined without matrix separation. The precision for all the constituents was
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Advanced Sensor Technologies Research · Metallurgical and Alloy Processes
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (18)
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