A high entropy silicide by reactive spark plasma sintering
Source abstract
Abstract
A high-entropy silicide (HES), (Ti0.2Zr0.2Nb0.2Mo0.2W0.2)Si2 with close-packed hexagonal structure is successfully manufactured through reactive spark plasma sintering at 1300 °C for 15 min. The elements in this HES are uniformly distributed in the specimen based on the energy dispersive spectrometer analysis except a small amount of zirconium that is combined with oxygen as impurity particles. The Young’s modulus, Poisson’s ratio, and Vickers hardness of the obtained (Ti0.2Zr0.2Nb0.2Mo0.2W0.2)Si2 are also measured.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: High Entropy Alloys Studies · High-Temperature Coating Behaviors · Metal and Thin Film Mechanics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (32)
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