Effects of oxygen and ammonia plasma treatment on polyphenylene sulfide thin films and their interaction with epoxy adhesive

X-Ray photoelectron spectroscopy (XPS) and infrared reflection absorption spectroscopy (IRRAS) were used to study the chemical modification of polyphenylene sulfide (PPS) thin films on exposure to both oxygen and ammonia plasmas. The XPS results for the oxygen plasma treatment indicated a large oxygen increase with the incorporation of various oxidized carbon species as well as oxidized sulfur. For the ammonia plasma, both nitrogen and oxygen were incorporated. IRRAS proved to complement the XPS results, showing a wide range of C-O and C=O functionalities incorporated on oxygen plasma exposure. For the ammonia plasma treatment, an increase in hydrocarbon, alkene-type fragments, and possibly amine groups was detected. Both the XPS and IRRAS results indicated that exposure of plasma-treated surfaces to epoxy with subsequent carbon tetrachloride washes removed most of the modification originally present after plasma treatment. IRRAS analysis showed that a thin layer of epoxy remained after repeated solvent washes and that the film seemed to be cured. For untreated PPS films, a non-cured epoxy film adsorbed. This work suggests that the plasma-modified layer plays a role in the formation of a covalent interphase region between PPS and epoxy.