SURFACE MODIFICATIONS AND ADHESION OF VULCANIZED SBR RUBBER TREATED WITH RF PLASMAS OF DIFFERENT GASES
Source abstract
Abstract
The surface modifications produced by treatment of a synthetic vulcanized styrene-butadiene rubber (R1) with oxidizing (oxygen, air, carbon dioxide) and nonoxidizing (nitrogen, argon) RF plasmas have been assessed by ATR-IR and XPS spectroscopy, SEM, and contact angle measurements. The effectiveness of the treatment depended on the gas atmosphere used to generate the RF plasma. In general, acceptable adhesion values of treated R1 rubber were obtained for all plasmas, except for the nitrogen plasma treatment during 15 min, due to the creation of weak layers of low molecular weight moieties on the outermost R1 rubber layer. A toluene wiping of the 15 min N2-plasma–treated R1 rubber surface removed those moieties, and increased adhesion was obtained. On the other hand, the air, carbon dioxide, and oxygen plasmas produced ablation of the R1 rubber surface, whereas mechanical degradation was not produced by treatment with the Ar plasma.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: High voltage insulation and dielectric phenomena · Silicone and Siloxane Chemistry · Surface Modification and Superhydrophobicity
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (21)
Show source-provided references
1. 10.1080/0021846920802654210.1080/00218469208026542 ↗
2. 10.5254/1.353621310.5254/1.3536213 ↗
3. 10.1080/0021846730807223410.1080/00218467308072234 ↗
4. Pastor-Blas, M. M., Sánchez-Adsuar, M. S. and Martín-Martínez, J. M. 1995.Polymer Surface Modification: Relevance to Adhesion, Edited by: Mittal, K. L. 379–400. Zeist: VSP.
5. Mort J. · 1986
6. 10.1002/(SICI)1096-9918(19980501)26:5<385::AID-SIA384>3.0.CO;2-K10.1002/(SICI)1096-9918(19980501)26:5<385::AID-SIA384>3.0.CO;2-K ↗
7. 10.1002/1096-9918(200008)30:1<7::AID-SIA711>3.0.CO;2-T10.1002/1096-9918(200008)30:1<7::AID-SIA711>3.0.CO;2-T ↗
8. 10.1023/A:101135290377510.1023/A:1011352903775 ↗
9. Inagaki N. · 1966
10. 10.1163/156856193X0060010.1163/156856193X00600 ↗
11. 10.1016/0014-3057(90)90250-810.1016/0014-3057(90)90250-8 ↗
12. 10.1163/156856196X0025610.1163/156856196X00256 ↗
13. 10.1116/1.57876010.1116/1.578760 ↗
14. 10.1016/0169-4332(96)00461-810.1016/0169-4332(96)00461-8 ↗
15. 10.1016/0169-4332(93)90038-D10.1016/0169-4332(93)90038-D ↗
16. 10.1163/156856194X0033910.1163/156856194X00339 ↗
17. 10.1063/1.35776510.1063/1.357765 ↗
18. Fox, D. W. 1982.Kirk-Othmer Encyclopedia of Chemical Technology, 3rd ed., Edited by: Grayson, M. 479New York: Wiley-Interscience.
19. 10.1016/0040-6090(93)90642-310.1016/0040-6090(93)90642-3 ↗
20. 2003
21. Langerwerf J. S. A. · Technicuir · 1973 · 3 · 79