journal article·1987-04

Organic Additives: A Source of Hydrogen in Copper Cathodes

E. Henry Chia, Y. Y. Su

JOM· Volume 39· Issue 4
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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Molten salt chemistry and electrochemical processes · Advancements in Battery Materials

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References (13)

Show source-provided references
1. E.H. Chia, private communication with Ludvigsson.
2. A.J. Phillips, “Gas and Other Impurity Reactions in Copper,” Metallurgical Transactions, Vol. 4, 1973, pp. 1935–1943.10.1007/BF02665421 ↗
3. E.H. Chia, Master’s Thesis “Gas Equilibrium in Copper,” Georgia Institute of Technology, June, 1967.
4. Y.Y. Su, “Analysis of the Factors Affecting the Drawability of Copper Rods,” Wire Journal International, Jan. 1982, pp. 35–43.
5. M. Leisch and K.D. Rendulic, “A Mass Spectrometric Investigation of the Incorporation of Organic Matter into Electrodeposits,” Z. Metallkde., Vol. 75, 1984, pp. 459–462.
6. M. Pourbaix, “Lectures on Electrochemical Corrosion,” Plenum Press, New York, 1973.10.1007/978-1-4684-1806-4 ↗
7. R. Winand, G. Troch, M. Degreg and P. Harlet, “Industrial Electrodeposition of Copper” from Application of Polarization Measurements in the Control of Metal Deposition,” edited by I.H. Warren, Elsevier, New York.
8. B.K.J. Hoekstra, B.C. Sison and D. Trivich, “Role of Thiourea in the Electrodeposition of Copper,” J. Electrochem. Soc., Vol. 106, 1959, pp. 382–388.10.1149/1.2427364 ↗
9. Ph. Javet and H.E. Hintermann, “Aspect du Comportement de la Thiouree en Solution Cuivrique,” Electrochimic Acta., Vol. 14, 1969, pp. 527–552.10.1016/0013-4686(69)87038-6 ↗
10. C.C. Roth and H. Leidheisen, Jr., “The Interaction of Organic Compounds with the Surface during the Electrodeposition of Nickel,” J. Electrochem. Soc., Vol. 100, 1953, pp. 553–560.10.1149/1.2780896 ↗
11. B.K. John, J. Hoekstra, B.C. Sison, Jr., and D. Trivich, “Role of Thiourea in the Electrodeposition of Copper,” J. Electrochem. Soc., Vol. 106, 1959, pp. 382–388.10.1149/1.2427364 ↗
12. J. Liopis, J.M. Gamboa, L. Arizmendi and F. Alonso, “Tarnishing Reaction of Copper with Solutions of Thiourea and Derivations, Study by Radiotracers,” J. Electrochem. Soc., Vol. 109, 1962, pp. 368–377.10.1149/1.2425427 ↗
13. G. Lahousse and L. Herrman, “Effect of Thio Compounds on the Electrodeposition of Copper,” Bull. Soc. Chim., Beleges, Vol. 80, 1971, pp. 125–132.10.1002/bscb.19710800114 ↗