Microstructure and magnetron sputtering properties of tungsten target fabricated by low pressure plasma spraying
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Abstract
Abstract Planar and rotary tungsten targets were fabricated by low pressure plasma spraying (LPPS). Relative density, oxygen content by mass, microstructure, micro-hardness and ultimate tensile strength (UTS) of LPPS tungsten targets were all influenced by vacuum pressure. Compared with 1.3 × 104 Pa and 6.5 × 104 Pa, a vacuum pressure of 3.9 × 104 Pa was optimal for preparing high-quality tungsten targets. Oxygen content by mass, porosity, average grain size, micro-hardness and UTS of LPPS target fabricated under 3.9 × 104 Pa were about 0.18%, 2.8%, 0.9 μm, 377.8HV0.025 and 201.1 MPa, respectively. Electron backscattered diffraction (EBSD) from the LPPS sample (fabricated under 3.9 × 104 Pa) showed that proportions of 〈001〉, 〈011〉 and 〈111〉 oriented grains were 10.6%, 21.0% and 12.3% of the total, respectively. The tungsten target possessed excellent magnetron sputtering performance since most tungsten grains with a size
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