Identification of Hexagonal Boron Nitride Thickness on SiO2/Si Substrates by Colorimetry and Contrast

Hexagonal boron nitride (hBN) is a layered material with a wide variety of excellent properties for emergent applications in quantum photonics using atomically thin materials. For example, it hosts single-photon emitters that operate up to room-temperature, it can be exploited for atomically flat tunnel barriers, and it can be used to form high finesse photonic nanocavities. Moreover, it is an ideal encapsulating dielectric for two-dimensional (2D) materials and heterostructures, with highly beneficial effects on their electronic and optical properties. Depending on the use case, the thickness of hBN is a critical parameter and needs to be carefully controlled from the monolayer to hundreds of layers. This calls for quick and non-invasive methods to unambiguously identify the thickness of exfoliated flakes. Here, we show that the apparent color of hBN flakes on different SiO2/Si substrates can be made to be highly indicative of the flake thickness, providing a simple method to infer the hBN thickness. Using experimental determination of the colour of hBN flakes and calculating the optical contrast, we derived the optimal substrates for the most reliable hBN thickness identification for flakes with thickness ranging from a few layers towards bulk-like hBN. Our results offer a practical guide for the determination of hBN flake thickness for widespread applications using 2D materials and heterostructures.