Annealing Process-Induced Microstructural Variation in NiV/B4C Multilayers
Source abstract
Abstract
The annealing process is one of the most common methods used to study the thermal stability of multilayers. To study the effect of the annealing process on the microstructural variation in NiV/B4C multilayers, different annealing experiments were performed on NiV/B4C multilayers with a d-spacing of 8 nm. This work provides a foundation for the fabrication of non-periodic NiV/B4C multilayers. The NiV/B4C multilayers were investigated by grazing-incidence X-ray reflectometry (GIXR), X-ray diffuse scattering (XRS), atomic force microscopy (AFM), X-ray diffraction (XRD), grazing-incidence small-angle X-ray scattering (GISAXS) and transmission electron microscopy (TEM). The temperature-dependent experiments showed that annealing at 70–290 °C slightly increased the period thickness and interface width. Annealing at higher temperatures resulted in significant structural changes and thickness ratio (Г = dNiV/d) changes from 0.4 to 1/3 at 340 °C. The time-dependent results showed that the microstructural variations primarily occurred after 60 min. The XRD, XRS, GISAXS and TEM were further used to study microstructural changes. It was found that the NiV/B4C multilayers exhibited a microcrystal structure after annealing, and that enhanced crystallinity and an increase in interface roughness were the main reasons for the microstructural changes.
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Research context
OpenAlex topics: Semiconductor materials and interfaces · Aluminum Alloys Composites Properties · Boron and Carbon Nanomaterials Research
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Key Laboratory of Advanced Micro-Structured Materials, MOE, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201204, China
Funding
National Key Research and Development Program of China · National Natural Science Foundation of China (NSFC)
References (28)
Show source-provided references
1. High spin-polarization in ultrathin Co2MnSi/CoPd multilayers10.1016/j.jmmm.2014.10.030 ↗
2. Multilayer heterostructures of magnetic Heusler and binary compounds from first principles10.1016/j.jmmm.2015.10.037 ↗
3. Mechanical properties of thin films and multilayers10.1016/S1359-0286(96)80051-9 ↗
4. Study of optical response near the absorption edge using vacuum ultra violet/soft X-ray reflectivity beamline on Indus-110.1088/1742-6596/80/1/012031 ↗
5. Exchange anisotropy—A review10.1016/S0304-8853(99)00453-9 ↗
6. Chen, C.M.H., Christensen, F.E., Harrison, F.A., Mao, P.H., and Windt, D.L. (2002, January 22–28). Design of a soft gamma-ray focusing telescope for the study of nuclear lines. Proceedings of the X-Ray and Gamma-Ray Telescopes and Instruments for Astronomy, Waikoloa, HI, USA.10.1117/12.461419 ↗
7. Ch, M., Carau, D., and Peffen, J.-C. (2017, January 6–10). Double multilayer monochromators for upgraded ESRF beamlines. Proceedings of the Advances in X-Ray/EUV Optics and Components XII, San Diego, CA, USA.
8. High temperature annealing effect on structural and magnetic properties of Ti/Ni multilayers10.1016/j.apsusc.2006.05.036 ↗
9. Prasciolu, M., and Bajt, S. (2018). On the properties of WC/SiC multilayers. Appl. Sci., 8.10.3390/app8040571 ↗
10. Effect of thermal annealing on structure and magnetic properties in a Ni–Cr multilayer10.1515/ijmr-2022-0063 ↗
11. Microstructure and stability comparison of nanometer period W/C, WC/C, and Ru/C multilayer structures10.1557/PROC-187-95 ↗
12. Microstructure-roughness interrelation in Ru/C and Ru/B4C X-ray multilayers10.1557/PROC-280-161 ↗
13. Structure and stress studies of low temperature annealed W/Si multilayers for the X-ray telescope10.1364/OE.24.015620 ↗
14. Characterization of Mo/Si soft X-ray multilayer mirrors by grazing-incidence small-angle X-ray scattering10.1016/j.vacuum.2009.04.026 ↗
15. Diffuse X-ray scattering of amorphous multilayers
16. Nanometer-scale period Sc/Cr multilayer mirrors and their thermal stability10.1016/j.tsf.2005.10.051 ↗
17. Chang, C., Wei, Z., Jiang, H., Ni, H., Song, W., He, J., Xiang, S., Wang, Z., Zhang, Z., and Zhang, Z. (2024). Effect of annealing on stress, microstructure, and interfaces of NiV/B4C multilayers. Coatings, 14.10.3390/coatings14040513 ↗
18. Thickness-dependent surface morphology and crystallization of HfO2 coatings prepared with ion-assisted deposition10.1016/j.tsf.2017.10.010 ↗
19. IMD—Software for modeling the optical properties of multilayer films10.1063/1.168689 ↗
20. Thermally induced interface changes in W/B4C multilayers10.1016/j.tsf.2015.05.030 ↗
21. Thermal stability of B-based multilayer mirrors for next-generation lithography10.1016/j.tsf.2017.09.033 ↗
22. Synthesis, stability, and electrochemical properties of NiAl and NiV layered double hydroxides10.1039/b004542j ↗
23. In situ GISAXS study on the temperature-dependent performance of multilayer monochromators from the liquid nitrogen cooling temperature to 600 °C10.1016/j.apsusc.2019.144838 ↗
24. Effect of roughness correlations in multilayers on Bragg peaks in X-Ray diffuse scattering10.1016/0921-4526(95)00902-7 ↗
25. Low-energy ion polishing of Si in W/Si soft X-ray multilayer structures10.1063/1.5097378 ↗
26. Grazing-incidence small-angle X-ray scattering study of correlated lateral density fluctuations in W/Si multilayers
27. Comparison of thermal stability of Mo/Si multilayers with different crystallinities of Mo layers10.1364/AO.482940 ↗
28. X-ray standing wave and reflectometric characterization of multilayer structures10.1103/PhysRevB.63.245409 ↗