An Exploration into Damage Repair and Manufacturing Technology of Photomask Glass Substrates
Source abstract
Abstract
There are strict requirements on the surface-shape accuracy, cracks, scratches, and subsurface damage of photomask glass substrates with the advancement of photo-etching technology. In this study, photomask quartz glass substrates were etched with the hydrofluoric (HF) acid etching method after chemical mechanical polishing (CMP), so that the polishing hydrolysis layer could be completely removed. In addition, the surface scratches caused by CMP were observed with a surface quality detection device and a white light interferometer. Second, the high-efficiency array-type magnetorheological polishing technology was employed to eliminate the surface-shape error on the surface of quartz photomask glass substrates. Finally, the removal function rotation angle based magnetorheological polishing technology was utilized to evenly remove the mid-frequency ripples and scratches caused in the preceding technological process. The experimental results demonstrated that these technologies can be used to realize rapid damage removal and high-quality processing of photomask glass substrates.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Advanced machining processes and optimization · Diamond and Carbon-based Materials Research
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
College of Intelligence Science and Technology, National University of Defense Technology, 109 Deya Road, Changsha 410073, China
Hunan Key Laboratory of Ultra-Precision Machining Technology, Changsha 410073, China
Laboratory of Science and Technology on Integrated Logistics Support, National University of Defense Technology, 109 Deya Road, Changsha 410073, China
Funding
National Key R&D Program of China · National Natural Science Foundation of China · Chinese Academy of Sciences
References (19)
Show source-provided references
1. Li, P.J. (2021). Applications of optoelectronic integrated circuit technology. Integr. Circuit Appl.
2. Fu, B., Wang, Y.F., Rao, C.D., Xiang, Z.K., and Shao, Z.F. (2015, January 19–21). Low expansion quartz glass. Proceedings of the 2015 National Glass Science and Technology Annual Conference Proceedings, Shanghai, China.
3. Alternative smoothing techniques to mitigate EUV substrate defectivity10.1117/12.916497 ↗
4. Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process10.1016/j.optmat.2013.11.022 ↗
5. Development and Challenges of Lithography for ULSI
6. Chen, Y.L., Shen, J.M., and Tang, M.M. (2021). Overview of the manufacturing process of photomasked quartz glass substrates. Glass Enamel Opt., 49.
7. Research on chemo-mechanical grinding of large size quartz glass substrate10.1016/j.precisioneng.2009.01.006 ↗
8. Qiu, Z.J., Zhou, L.B., and Fang, F.Z. (2010). Chemical-mechanical grinding of quartz glass. Opt. Precis. Eng., 18.
9. Xie, R. (2018, January 5). Research on high-efficiency polishing technology of photomask substrate. Proceedings of the Young Scientists Forum 2017, Shanghai, China.10.1117/12.2314931 ↗
10. Chemical mechanical polishing of ultra-precision quartz glass
11. Li, H.B., Wang, C.W., Li, H., Zhang, W.Q., and Liu, Y.L. (2018). Chemical mechanical polishing of quartz glass based on alkaline silica-sol abrasives. Micro-Nanoelectron., 55.
12. Zhu, Y.W., Shen, Q., Wang, Z.K., Ling, S.Z., Li, J., and Zuo, D. (2016). Exploration of the performance of polycrystalline diamond solidified abrasive grinding pads for fine grinding of quartz glass. Infrared Laser Eng., 45.
13. Liu, D.F., Chen, T., and Chen, G.L. (2016). Material removal mechanism of soft particle polished quartz glass. Opt. Precis. Eng., 24.
14. Shen, X. (1997). Sampling problem for measuring surface roughness of optical elements. Opt. Instruments, 19.
15. Wang, Z. (2008). Study on the Key Technologies of Subsurface Damage Detection and Control in Optical Material Processin, National University of Defense Science and Technology.
16. DeGroote, J.E., Romanofsky, H.J., and Kozhinova, I.A. (2003, January 22). Polishing PMMA and other optical polymers with magnetorheological finishing. Proceedings of the Optical Manufacturing and Testing V, SPIE’s 48th Annual Meeting, San Diego, CA, USA.10.1117/12.506860 ↗
17. Hallock, B., Dumas, P., and Shorey, A. (2005, January 18). Recent advances in deterministic low-cost finishing of sapphire windows. Proceedings of the SPIE-The International Society for Optical Engineering, Orlando, FL, USA.10.1117/12.603930 ↗
18. Wan, S., Wei, C., Hu, C., Situ, G., Shao, Y., and Shao, J. (2021). Novel magic angle-step state and mechanism for restraining the path ripple of magnetorheological finishing. Int. J. Mach. Tools Manuf., 161.10.1016/j.ijmachtools.2020.103673 ↗
19. Key technology research on magnetorheological finishing based on suppression of surface mid-spatial frequency ripple errors10.1364/OME.466310 ↗