Oxidation and interdiffusion behavior of a germanium-modified silicide coating on an Nb–Si-based alloy
Source abstract
Abstract
To investigate the interdiffusion behavior of Ge-modified silicide coatings on an Nb–Si-based alloy substrate, the coating was oxidized at 1250°C for 5, 10, 20, 50, or 100 h. The interfacial diffusion between the (Nb,X)(Si,Ge)2 (X = Ti, Cr, Hf) coating and the Nb–Si based alloy was also examined. The transitional layer is composed of (Ti,Nb)5(Si,Ge)4 and a small amount of (Nb,X)5(Si,Ge)3. With increasing oxidation time, the thickness of the transitional layer increases because of the diffusion of Si from the outer layer to the substrate, which obeys a parabolic rate law. The parabolic growth rate constant of the transitional layer under oxidation conditions is 2.018 μm·h−1/2. Moreover, the interdiffusion coefficients of Si in the transitional layer were determined from the interdiffusion fluxes calculated directly from experimental concentration profiles.
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Research context
OpenAlex topics: Intermetallics and Advanced Alloy Properties · Semiconductor materials and interfaces · High-Temperature Coating Behaviors
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References (37)
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