Error Model and Frequency Modulation Characteristics Analysis of Laser Processing Platform for Micro Crystal Resonator
Source abstract
Abstract
Laser processing platform for micro crystal resonator (MCR) frequency modulation is an important piece of equipment to apply laser etching technology to the MCR frequency modulation process. The positioning accuracy of the laser processing platform has an important influence on frequency modulation characteristics. In order to improve the precision and efficiency of the laser processing platform for MCR frequency modulation, the error model of the laser processing platform for MCR frequency modulation is established based on the multi-body system theory. According to the Monte Carlo simulation method, the influence of laser processing platform error for MCR on frequency modulation characteristics is analyzed. Considering the requirements of the MCR frequency modulation process, the laser processing platform for MCR frequency modulation is built, and the frequency deviation and frequency modulation performance are verified to meet the engineering requirements.
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Research context
OpenAlex topics: Advanced Measurement and Metrology Techniques · Advanced Surface Polishing Techniques · Laser Material Processing Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
School of Mechanical and Electronic Engineering, Wuhan University of Technology, 122 Luoshi Road, Wuhan 430070, China
Key Laboratory of Hubei Province for MicroNano Crystal Processing Technology, Zengdu Economic Development Zone, Suizhou 441300, China
References (21)
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