Sub-Wavelength Scale Si Inverted Pyramid Fabrication with Enhanced Size Control by Using Silica Sphere Lithography Technique
Source abstract
Abstract
In this paper, we present a novel silicon (Si) subwavelength-scale surface structure (SWSS) fabrication process using the silica sphere (SS) lithography technique, which allows controllable geometries. The process involves a new cost-effective solvent-controlled spin-coating method that deposits SS on large Si surface areas with enhanced SS monolayer coverage and uniformity compared to conventional methods. The larger areas and rapid, low cost processing allow colloidal sphere lithography to be realistically used for solar cells. We successfully demonstrate 1.57 μm diameter SS on a 2-inch round Si wafer with more than 95% SS monolayer coverage and great uniformity. Using these deposited SS, a SWSS fabrication process was designed and successfully demonstrated Si inverted pyramid structures with dimension on the order of 1.1 μm, thus potentially providing a new technique for effective light-management of thin crystalline Si solar cells.
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Research context
OpenAlex topics: Optical Coatings and Gratings · Photonic and Optical Devices · Nanowire Synthesis and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Materials Science and Engineering, Dong-A University, Saha-gu, Busan 604-714, Korea
School of Electrical, Computer and Energy Engineering, Arizona State University, Tempe, AZ 85287, USA
Funding
National Science Foundation
References (33)
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