DataVXApplied SciencesPaper
journal article·2019-02-22Open access

Improving the Lot Fabrication Stability and Performance of Silica Optical Films during PECVD

Yu Zheng, Piaopiao Gao, Zhixin Xiao, Jianying Zhou, Ji’an Duan, Bo Chen

Applied Sciences· Volume 9· Issue 4
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Source abstract

Abstract

Silica optical film specifications are determined by their processing capability and their fabrication stability. Here, a statistical process control (SPC) approach usually used in planar lightwave circuits (PLC) is adopted to analyze the stability of the silica optical film fabrication process. Apart from the raw materials, certain key external factors have to be taken into consideration during the PLC process, such as temperature, relative humidity, process variation and machine aging. The fabrication process can be adjusted according to SPC-based results in real-time, so as to produce high quality silica optical film. By using this method, it is possible to assess the effectiveness of older production lines and extend their production capacity at minimal cost.
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Research context

OpenAlex topics: Semiconductor Lasers and Optical Devices · Photonic and Optical Devices · Analytical Chemistry and Sensors

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

State Key Laboratory of High Performance Complex Manufacturing, College of Mechanical and Electrical Engineering, Central South University, Changsha, Hunan 410083, China

Hunan Institute of Technology, Hengyang 421002, China

Hunan New Fiber Optical Electronics Co., Ltd., Baojing, Hunan 416500, China

Funding

the National Natural Science Foundation of China · The National Key Research and Development Program of China · the Key Research and Development Program of Hunan Province, China · the State Key Laboratory of High Performance Complex Manufacturing, Central South University · the Key Laboratory for Precision & Non-traditional Machining of Ministry of Education, Dalian University of Technology

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