Evaluating the Efficacy of the More Young HIFU Device for Facial Skin Improvement: A Comparative Study with 7D Ultrasound
Source abstract
Abstract
High-Intensity Focused Ultrasound (HIFU) is a non-invasive technology widely used in aesthetic dermatology for skin tightening and facial rejuvenation. This study aimed to evaluate the safety and efficacy of a modified HIFU device, More Young, compared to the standard 7D HIFU system through a randomized, single-blinded clinical trial. The More Young device features enhanced focal depth precision and energy delivery algorithms, including nine pre-programmed stabilization checkpoints to minimize treatment risks. A total of 100 participants with facial wrinkles and skin laxity were randomly assigned to receive either More Young or 7D HIFU treatment. Skin improvements were assessed at baseline and one to six months post-treatment using the VISIA® Skin Analysis System (7th Generation), focusing on eight key parameters. Patient satisfaction was evaluated through the Global Aesthetic Improvement Scale (GAIS). Data were analyzed using paired and independent t-tests, with effect sizes measured via Cohen’s d. Both groups showed significant post-treatment improvements; however, the More Young group demonstrated superior outcomes in wrinkle reduction, skin tightening, and texture enhancement, along with higher satisfaction and fewer adverse effects. No significant differences were observed in five of the eight skin parameters. Limitations include the absence of a placebo group, limited sample diversity, and short follow-up duration. Further studies are needed to validate long-term outcomes and assess performance across varied demographics and skin types.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Dermatologic Treatments and Research · Skin Protection and Aging · Hair Growth and Disorders
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
College of Life Science and Bio-Engineering, Beijing University of Technology, Beijing 100124, China
Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
Funding
National Key Research and Development Program of China · National Natural Science Foundation of China
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