DataVXApplied SciencesPaper
journal article·2020-05-28Open access

Structure and Properties of Tantalum Coatings Obtained by Electron Beam Technology on Aluminum Substrates

Khatia Ananiashvili, Mikheil Okrosashvili, Tamar Loladze, Natalia Valko, Tomasz N. Koltunowicz

Applied Sciences· Volume 10· Issue 11
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Source abstract

Abstract

The paper deals with the study of the structure and properties of tantalum coatings formed by electron beam evaporation and deposition of tantalum powder on 300–450 °C aluminum substrate. The research results of surface morphology, phase and elemental composition show that high activity of an aluminum substrate and specific conditions for vapor-phase technology promote formation of tantalum coatings characterized by a high degree of crystalline grains, with high adhesion and hardness despite the surface cracks. It was observed that the optimum deposition temperature of tantalum on aluminum substrates varies from 300 °C to 350 °C. These coatings demonstrate excellent physical and mechanical properties due to formation of intermetallic phases in the reactive zone.
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Research context

Metals & alloysMaterials processing

OpenAlex topics: Metal and Thin Film Mechanics · Advanced Materials Characterization Techniques · High-Temperature Coating Behaviors

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Metallurgy, Materials Science and Metal Treatment, Faculty of Chemical Technology and Metallurgy, Georgian Technical University, 69, M. Kostava Street, Tbilisi 0175, Georgia

Department of General Physics, Yanka Kupala State University of Grodno, 22, Ozheshko Street, Grodno 230023, Belarus

Department of Electrical Devices and High Voltage Technology, Lublin University of Technology, 38a, Nadbystrzycka Street, Lublin 20-618, Poland

Funding

Shota Rustaveli National Science Foundation · Ministerstwo Nauki i Szkolnictwa Wyższego

References (11)

Show source-provided references
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