Metalens-based 3D nanolithography breaks the throughput barrier
Source abstract
Abstract
Abstract A metalens-based two-photon lithography platform with spatially adaptive illumination enables a breakthrough in fabrication throughput for high-precision wafer-scale 3D nanoprinting.
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Nonlinear Optical Materials Studies · Optical Coatings and Gratings
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Huazhong University of Science and Technology
The Chinese University of Hong Kong
Centre for Perceptual and Interactive Intelligence (CPII)
Optics Valley Laboratory
Funding
National Key Research and Development Program of China · Research Grant Council, Senior Research Fellow Scheme · General Research Fund
References (5)
Show source-provided references
1. The physics of 3D printing with light10.1038/s42254-023-00671-3 ↗
2. Acousto-optic scanning spatial-switching multiphoton lithography10.1088/2631-7990/ace0a7 ↗
3. High-throughput two-photon 3D printing enabled by holographic multi-foci high-speed scanning10.1021/acs.nanolett.4c00505 ↗
4. Scalable submicrometer additive manufacturing10.1126/science.aax8760 ↗
5. 3D nanolithography with metalens arrays and spatially adaptive illumination10.1038/s41586-025-09842-x ↗