Issue Information

Cover Photograph : Contours of the predicted temperature and SiO2 concentrations in x‐z plane (at y = 0) for the cases with SiCl4 injection from the (A, D) first layer nozzle, (B, E) secondary layer nozzle and (C, F) fourth layer nozzle during fused silica glass synthesis by chemical vapor deposition. The nozzles are annular and arranged sequentially from the center of the burner to its outside. The analysis shows that the SiCl4 injection position has a small effect on flame temperature (see A‐C) due to the small heat release from the SiCl4 combustion. But great differences are found in the SiO2 concentration distributions. For SiCl4 injection from the first layer nozzle, SiO2 monomers are primarily concentrated in the centerline (see D). While a low‐high‐low SiO2 distribution is found along the radial direction from the centerline to the side when SiCl4 is injected from the fourth layer nozzle (see F), Uniform SiO2 distribution is found for SiCl4 injection from the secondary layer nozzle (see E). DOI: 10.1111/ijag.14771 . image