journal article·2020-06-10Open access

Structural Modifications in Epitaxial Graphene on SiC Following 10 keV Nitrogen Ion Implantation

Priya Darshni Kaushik, Gholam Reza Yazdi, Garimella Bhaskara Venkata Subba Lakshmi, Grzegorz Greczynski, Rositsa Yakimova, Mikael Syväjärvi

Applied Sciences· Volume 10· Issue 11

Abstract

Modification of epitaxial graphene on silicon carbide (EG/SiC) was explored by ion implantation using 10 keV nitrogen ions. Fragments of monolayer graphene along with nanostructures were observed following nitrogen ion implantation. At the initial fluence, sp3 defects appeared in EG; higher fluences resulted in vacancy defects as well as in an increased defect density. The increased fluence created a decrease in the intensity of the prominent peak of SiC as well as of the overall relative Raman intensity. The X-ray photoelectron spectroscopy (XPS) showed a reduction of the peak intensity of graphitic carbon and silicon carbide as a result of ion implantation. The dopant concentration and level of defects could be controlled both in EG and SiC by the fluence. This provided an opportunity to explore EG/SiC as a platform using ion implantation to control defects, and to be applied for fabricating sensitive sensors and nanoelectronics devices with high performance.
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Research context

OpenAlex topics: Graphene research and applications · Diamond and Carbon-based Materials Research · Boron and Carbon Nanomaterials Research

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics, Chemistry and Biology, Linköping University, SE-58183 Linköping, Sweden

Special Centre for Nanoscience, Jawaharlal Nehru University, New Delhi 110067, India

Funding

ÅForsk research grant

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