Natural overlaying behaviors push the limit of planar cyclic deformation performance in few‐layer MoS2 nanosheets
Abstract
Research context
OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Graphene research and applications
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Affiliations
Shenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences Shenzhen the People's Republic of China
CAS Key Laboratory of Standardization and Measurement for Nanotechnology CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology Beijing the People's Republic of China
Beijing Advanced Innovation Center for Materials Genome Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies University of Science and Technology Beijing Beijing the People's Republic of China
State Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering University of Science and Technology Beijing Beijing the People's Republic of China
College of Chemistry and Materials Engineering Zhejiang A&F University Hangzhou the People's Republic of China
Center for X‐mechanics, School of Aeronautics and Astronautics Zhejiang University Hangzhou People's Republic of China
Department of Mechanical Engineering The University of Hong Kong Hong Kong the People's Republic of China
Funding
National Key Research and Development Program of China · National Natural Science Foundation of China