Poly(lactic acid)-based piezoelectret metamaterials for high-sensitivity and shape-adaptive sensing applications
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Dielectric materials and actuators · Advanced Sensor and Energy Harvesting Materials · Acoustic Wave Phenomena Research
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (36)
Show source-provided references
1. J. Hillenbrand, G.M. Sessler, J. Acoust. Soc. Am. 116, 3267 (2004)10.1121/1.1810272 ↗
2. M. Dansachmüller, I. Minev, P. Bartu, I. Graz, N. Arnold, S. Bauer, Appl. Phys. Lett. 91, 222906 (2007)10.1063/1.2819090 ↗
3. J. Hillenbrand, M. Kodejska, Y. Garcin, H.V. Seggern, G.M. Sessler, IEEE Trans. Dielectr. Electr. Insul. 17, 1021 (2010)10.1109/TDEI.2010.5539670 ↗
4. N. Wang, H. Zhang, X. Qiu, R. Gerhard, J. van Turnhout, J. Cressotti, D. Zhao, L. Tang, Y. Cao, Advanced Materials, n/a, 2400657 (2024)
5. N. Wu, X.F. Cheng, Q.Z. Zhong, J.W. Zhong, W.B. Li, B. Wang, B. Hu, J. Zhou, Adv. Funct. Mater. 25, 4788 (2015)10.1002/adfm.201501695 ↗
6. L. Liu, S. Niu, J. Zhang, Z. Mu, J. Li, B. Li, X. Meng, C. Zhang, Y. Wang, T. Hou, Z. Han, S. Yang, L. Ren, Adv. Mater. 34, 2200823 (2022)10.1002/adma.202200823 ↗
7. Q. Hu, T. Zhang, G.M. Sessler, H. von Seggern, A.A. Altmann, M. Kupnik, Z. Shi, X. Zhang, Appl. Phys. Lett. 124, 142902 (2024)10.1063/5.0196696 ↗
8. Z. Shi, Q. Hu, A.A. Altmann, H. von Seggern, G.M. Sessler, M. Kupnik, S. Zhukov, X. Ma, X. Zhang, J. Appl. Phys. 136, 234102 (2024)10.1063/5.0239250 ↗
9. G.M. Sessler, J. Hillenbrand, Appl. Phys. Lett. 75, 3405 (1999)10.1063/1.125308 ↗
10. M. Paajanen, H. Välimäki, J. Lekkala, J. Electrostat. 48, 193 (2000)10.1016/S0304-3886(99)00065-0 ↗
11. U.D. Larsen, O. Signund, S. Bouwsta, J. Microelectromech. Syst. 6, 99 (1997)10.1109/84.585787 ↗
12. J.X. Qiao, C.Q. Chen, Int. J. Impact Eng. 83, 47 (2015)10.1016/j.ijimpeng.2015.04.005 ↗
13. H. Yang, B. Wang, L. Ma, Compos. Struct. 214, 359 (2019)10.1016/j.compstruct.2019.01.076 ↗
14. Y. Wei, B. Li, M. Domingos, Z. Qian, Y. Zhu, L. Yan, L. Ren, G. Wei, Commun. Eng. 2, 80 (2023)10.1038/s44172-023-00131-x ↗
15. Z. Zhang, S. Liu, M. Wu, S. Liu, Appl. Mater. Today. 35, 101996 (2023)10.1016/j.apmt.2023.101996 ↗
16. L. Merces, L.M.M. Ferro, A. Thomas, D.D. Karnaushenko, Y. Luo, A.I. Egunov, W. Zhang, V.K. Bandari, Y. Lee, J.S. McCaskill, M. Zhu, O.G. Schmidt, D. Karnaushenko, Advanced Materials, n/a, 2313327 (2024)
17. W. Li, D. Torres, T. Wang, C. Wang, N. Sepúlveda, Nano Energy. 30, 649 (2016)10.1016/j.nanoen.2016.10.007 ↗
18. L. Lu, W. Ding, J. Liu, B. Yang, Nano Energy. 78, 105251 (2020)10.1016/j.nanoen.2020.105251 ↗
19. X. Ma, H. von Seggern, G.M. Sessler, S. Zhukov, O.B. Dali, M. Kupnik, X. Zhang, Smart Mater. Struct. 30, 015002 (2021)10.1088/1361-665X/abc525 ↗
20. S. Zhukov, X. Ma, H. Seggern, G.M. Sessler, O.B. Dali, M. Kupnik, X. Zhang, Appl. Phys. Lett. 117, 112901 (2020)10.1063/5.0023153 ↗
21. X. Ma, S. Zhukov, H. von Seggern, G.M. Sessler, O. Ben Dali, M. Kupnik, Y. Dai, P. He, X. Zhang, Adv. Electron. Mater. 9, 2201070 (2023)10.1002/aelm.202201070 ↗
22. Y. Qin, X. Ma, Z. Ruan, X. Xiang, Z. Shi, L. Zhou, Q. Hu, X. Zhang, ACS Appl. Mater. Interfaces. 16, 62680 (2024)10.1021/acsami.4c13772 ↗
23. F. Qian, R. Jia, M. Cheng, A. Chaudhary, S. Melhi, S.D. Mekkey, N. Zhu, C. Wang, F. Razak, X. Xu, C. Yan, X. Bao, Q. Jiang, J. Wang, M. Hu, Adv. Compos. Hybrid. Mater. 7, 75 (2024)10.1007/s42114-024-00887-6 ↗
24. J. Ma, X. Du, H. Li, S. Liu, Y. Jin, Z. Xu, C. Chen, Polym. Compos. 46, 8281 (2025)10.1002/pc.29492 ↗
25. N. Behrendt, V. Altstädt, H.W. Schmidt, X. Zhang, G.M. Sessler, Dielectrics and, E. Insulation, IEEE Trans. on. 13, 992 (2006)10.1109/TDEI.2006.247824 ↗
26. H.V. Seggern, Thermally stimulated decay of negatively charged Teflon - FEP, Conference on Electrical Insulation & Dielectric Phenomena - Annual Report 1980, 1980, p. 34510.1109/EIDP.1980.7683864 ↗
27. X. Zhang, P. Pondrom, G.M. Sessler, X. Ma, Nano Energy. 50, 52 (2018)10.1016/j.nanoen.2018.05.016 ↗
28. H. Ohigashi, J. Appl. Phys. 47, 949 (1976)10.1063/1.322685 ↗
29. H. Varghese, H.M.A. Hakkeem, K. Chauhan, E. Thouti, S. Pillai, A. Chandran, Nano Energy. 98, 107339 (2022)10.1016/j.nanoen.2022.107339 ↗
30. D. Chen, R. Cui, C. Huang, Z. Wang, L. Niu, ACS Appl. Mater. Interfaces. 17, 18844 (2025)10.1021/acsami.4c22118 ↗
31. P. Pondrom, J. Hillenbrand, G.M. Sessler, J. Bös, T. Melz, Appl. Phys. Lett. 104, 172901 (2014)10.1063/1.4874305 ↗
32. S. Du, A. Xu, F. Li, S.M. Hosseini, Thin-Walled Struct. 179, 109588 (2022)10.1016/j.tws.2022.109588 ↗
33. B. Lin, V. Giurgiutiu, P. Pollock, B. Xu, J. Doane, AIAA J. 48, 635 (2010)10.2514/1.44776 ↗
34. M.L. Hakim, A. Herianto, S. Wiranata, D. Darmanto, G.N. Widagdo, M.A. Santos, Muflikhun, Sens. Actuators A: Phys. 387, 116397 (2025)10.1016/j.sna.2025.116397 ↗
35. X. Zhou, C. Ye, T. Okamoto, Y. Iwao, N. Kawata, A. Shimada, H. Haneishi, Jpn. J. Radiol. 42, 1425 (2024)10.1007/s11604-024-01638-9 ↗
36. K. Ahookhosh, W. Gsell, B. Tielemans, G. Vande, Velde, Front. Med. 12, 1621104 (2025)10.3389/fmed.2025.1621104 ↗