journal article·2026-06

Steam oxidation kinetics of TiN/TiAlN bilayer deposited on plasma etched Zircaloy-4 substrates using cylindrical magnetron sputtering

Kunal Trivedi, Ramkrishna Rane, Kiran K. Mandapaka, Alphonsa Joseph, Supratik Roychowdhury, Amit Arora

Applied Physics A· Volume 132· Issue 6
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OpenAlex topics: Nuclear Materials and Properties · Nuclear reactor physics and engineering · Heat transfer and supercritical fluids

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