journal article·2026-04

Improving etchability and imaging performance of EUV mask absorber materials via ion implantation

Yunsoo Kim, Dongmin Jeong, Seungho Lee, Bom-Sok Kim, Myung-Jin Kim, Taeho Lee, Jinho Ahn

Applied Physics A· Volume 132· Issue 4
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Abstract

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OpenAlex topics: Advancements in Photolithography Techniques · Silicon and Solar Cell Technologies · Photocathodes and Microchannel Plates

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References (22)

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