DataVXApplied Physics APaper
journal article·2026-03

Temperature behavior of the energy gap in amorphous HfO2 thin films

A. O. Shilov, S. S. Savchenko, A. S. Vokhmintsev, M. S. Karabanalov, A. V. Chukin, A. V. Ishchenko, V. A. Gritsenko, I. A. Weinstein

Applied Physics A· Volume 132· Issue 3
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OpenAlex topics: Semiconductor materials and devices · Thin-Film Transistor Technologies · Advancements in Semiconductor Devices and Circuit Design

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