Laser patterning of glass films for the fabrication of binary silicate glass optics
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OpenAlex topics: Laser Material Processing Techniques · Advanced Surface Polishing Techniques · Surface Roughness and Optical Measurements
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References (33)
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1. H. Luo, Y. Zhang, J. Yu, X. Dong, T. Zhou, Additive, subtractive and formative manufacturing of glass-based functional micro/nanostructures: A comprehensive review. Mater. Des. 233, 112285 (2023). https://doi.org/10.1016/j.matdes.2023.11228510.1016/j.matdes.2023.112285 ↗
2. S.N. Khonina, N.L. Kazanskiy, M.A. Butt, Grayscale lithography and a brief introduction to other widely used lithographic methods: a state-of-the-art review. Micromachines 15, 1321 (2024). https://doi.org/10.3390/mi1511132110.3390/mi15111321 ↗
3. C. Buerhop, R. Weissmann, N. Lutz, Ablation of silicate glasses by laser irradiation: modelling and experimental results. Appl. Surf. Sci. 54(C): 187–192, 1992. https://doi.org/10.1016/0169-4332(92)90042-V10.1016/0169-4332(92)90042-V ↗
4. J. Ihlemann, B. Wolff, P. Simon, Nanosecond and femtosecond excimer laser ablation of fused silica. Appl. Phys. Solids Surf. 54(4), 363–368 (1992). https://doi.org/10.1007/BF0032420310.1007/BF00324203 ↗
5. J. Li, P.R. Herman, M. Wei, K.P. Chen, J. Ihlemann, G. Marowsky, P. Oesterlin, B. Burghardt., High-resolution F2 -laser machining of micro-optic components. Proc. SPIE 4637: 228, 2002, https://doi.org/10.1117/12.47062710.1117/12.470627 ↗
6. A. Ben-Yakar, R.L. Byer, Femtosecond laser ablation properties of borosilicate glass. J. Appl. Phys. 96(9), 5316–5323 (2004). https://doi.org/10.1063/1.178714510.1063/1.1787145 ↗
7. A.A. Tseng, Recent developments in micromachining of fused silica and quartz using excimer lasers. Phys. Status Solidi Appl. Mater. Sci. 204(3), 709–729 (2007). https://doi.org/10.1002/pssa.20062245210.1002/pssa.200622452 ↗
8. A.A. Tseng, Y.T. Chen, C.L. Chao, K.J. Ma, T.P. Chen, Recent developments on microablation of glass materials using excimer lasers. Opt. Lasers Eng. 45(10), 975–992 (2007). https://doi.org/10.1016/j.optlaseng.2007.04.00310.1016/j.optlaseng.2007.04.003 ↗
9. X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, H. Niino, Micron- and submicron-sized surface patterning of silica glass by LIBWE method. J. Photochem. Photobiol Chem. 166, 1–3 (2004). https://doi.org/10.1016/j.jphotochem.2004.04.04010.1016/j.jphotochem.2004.04.040 ↗
10. B. Hopp, C. Vass, T. Smausz, Z. Bor, Production of submicrometre fused silica gratings using laser-induced backside dry etching technique. J. Phys. D Appl. Phys. 39(22), 4843–4847 (2006). https://doi.org/10.1088/0022-3727/39/22/01510.1088/0022-3727/39/22/015 ↗
11. J. Ihlemann, Micro patterning of fused silica by laser ablation mediated by solid coating absorption. Appl. Phys. Mater. Sci. Process. 93(1), 65–68 (2008). https://doi.org/10.1007/s00339-008-4663-310.1007/s00339-008-4663-3 ↗
12. J. Bekesi, J. Meinertz, P. Simon, J. Ihlemann, Sub-500-nm patterning of glass by nanosecond KrF excimer laser ablation. Appl. Phys. Mater. Sci. Process. 110(1), 17–21 (2013). https://doi.org/10.1007/s00339-012-7313-810.1007/s00339-012-7313-8 ↗
13. S. Pissadakis, L. Reekie, M. Hempstead, M.N. Zervas, J.S. Wilkinson, Ablated gratings on borosilicate glass by 193-nm excimer laser radiation. Appl. Phys. Mater. Sci. Process. 69(7), 739–741 (1999). https://doi.org/10.1007/s00339005151910.1007/s003390051519 ↗
14. J. Meinertz, T. Fricke-Begemann, J. Ihlemann, Micron and sub-micron gratings on glass by UV laser ablation. Phys. Procedia. 41, 708–712 (2013). https://doi.org/10.1016/j.phpro.2013.03.13710.1016/j.phpro.2013.03.137 ↗
15. R. Karstens, A. Gödecke, A. Prießner, J. Ihlemann, Fabrication of 250-nm-hole arrays in glass and fused silica by UV laser ablation. Opt. Laser Technol. 83, 16–20 (2016). https://doi.org/10.1016/j.optlastec.2016.03.02010.1016/j.optlastec.2016.03.020 ↗
16. T. Fricke-Begemann, J. Ihlemann, Hybrid micro-optical elements by laser-based fabrication of Fresnel lenses on the end face of gradient index lenses. Opt. Express. 26(18), 23751 (2018). https://doi.org/10.1364/oe.26.02375110.1364/oe.26.023751 ↗
17. C.M. Beckmann, J. Ihlemann, Figure correction of borosilicate glass substrates by nanosecond UV excimer laser irradiation. Opt. Express. 28(13), 18681 (2020). https://doi.org/10.1364/oe.39362610.1364/oe.393626 ↗
18. M. Schulz-Ruhtenberg, J. Ihlemann, J. Heber, „Laser patterning of SiOx-layers for the fabrication of diffractive phase elements for deep UV applications. Appl. Surf. Sci. 248, 190 (2005). https://doi.org/10.1016/j.apsusc.2005.03.09610.1016/j.apsusc.2005.03.096 ↗
19. J.-H. Klein-Wiele, J. Békési, P. Simon, J. Ihlemann, „Fabrication of SiO2 phase gratings by UV laser patterning of silicon suboxide layers and subsequent oxidation. J. Laser Micro/Nanoeng. 1, 211 (2006). https://doi.org/10.2961/jlmn.2006.03.001210.2961/jlmn.2006.03.0012 ↗
20. E. Joanni et al., Pulsed laser deposition of SiO2 - P2O5 - CaO - MgO glass coatings on titanium substrates. Mater. Res. Vol. 7(3), 431–436 (2014)10.1590/S1516-14392004000300010 ↗
21. T. Carlier et al., Aluminosilicate glass thin films elaborated by pulsed laser deposition. Appl. Surf. Sci. 397, 13–18 (2017). https://doi.org/10.1016/j.apsusc.2016.11.11510.1016/j.apsusc.2016.11.115 ↗
22. J. Gonzalo, O. Sanz, A. Perea, J.M. Fernández-Navarro, C.N. Afonso, J.G. López, High refractive index and transparent heavy metal oxide glassy thin films. Appl. Phys. Mater. Sci. Process. 76(6), 943–946 (2003). https://doi.org/10.1007/s00339-002-1918-210.1007/s00339-002-1918-2 ↗
23. C. Vasiliu et al., Thin films of advanced oxidic materials obtained by pulsed laser deposition. Appl. Surf. Sci. 253, 8278–8281 (2007). https://doi.org/10.1016/j.apsusc.2007.02.11510.1016/j.apsusc.2007.02.115 ↗
24. G.C. Chi, An e-beam evaporated borosilicate glass thin film as an encapsulant for annealing Be-implant InP. Mater. Chem. Phys. 39, 69–71 (1994)10.1016/0254-0584(94)90133-3 ↗
25. U. Hansen, S. Maus, J. Leib, M. Töpper, Robust and hermetic borosilicate glass coatings by E-Beam evaporation. Procedia Chem. 1(1), 76–79 (2009). https://doi.org/10.1016/j.proche.2009.07.01910.1016/j.proche.2009.07.019 ↗
26. Data sheet Schott N-BK7, https://www.schott.com/shop/advanced-optics/en/Optical-Glass/SCHOTT-N-BK7/c/glass-SCHOTT%20N-BK7%C2%AE
27. J. Meinertz, A. Gödecke, L.J. Richter, J. Ihlemann, „Fast fabrication of diffractive patterns on glass by excimer laser ablation. Opt. Laser Technol. 152, 108148 (2022). https://doi.org/10.1016/j.optlastec.2022.10814810.1016/j.optlastec.2022.108148 ↗
28. J. Serra et al., The role of the temperature and laser fluence on the properties of PLD bioactive glass films. Appl. Phys. A 79, 983 (2004). https://doi.org/10.1007/s00339-004-2610-510.1007/s00339-004-2610-5 ↗
29. T. Fricke-Begemann, J. Meinertz, R. Weichenhain-Schriever, J. Ihlemann, „Silicon suboxide (SiOx): laser processing and applications. Appl. Phys. A 117, 13 (2014). https://doi.org/10.1007/s00339-014-8236-310.1007/s00339-014-8236-3 ↗
30. J. Ihlemann, B. Wolff-Rottke, Excimer laser patterning of dielectric layers. Appl. Surf. Sci. 86, 228–233 (1995)10.1016/0169-4332(94)00416-1 ↗
31. J. Jahns, S. Helfert, Introduction To Micro- and Nanooptics (Wiley-VCH, Weinheim, Germany, 2012), p. 144
32. A. Chmyrov, J. Keller, T. Grotjohann, M. Ratz, E. d’Este, S. Jakobs, C. Eggeling, S.W. Hell, Nanoscopy with more than 100,000 ‘doughnuts’. Nat. Methods. 10, 737 (2013). https://doi.org/10.1038/nmeth.255610.1038/nmeth.2556 ↗
33. L.J. Richter, C.M. Beckmann, J. Meinertz, J. Ihlemann, Laser processing of silicon suboxide for the fabrication of multilevel fused silica diffractive phase elements. J. Laser Micro/Nanoeng. 13, 249 (2018). https://doi.org/10.2961/jlmn.2018.03.001810.2961/jlmn.2018.03.0018 ↗