Epitaxial La: HfO2 films deposited on (111)-oriented SrTiO3
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Ferroelectric and Negative Capacitance Devices · Electronic and Structural Properties of Oxides · Ferroelectric and Piezoelectric Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (51)
Show source-provided references
1. T.S. Böscke, J. Müller, D. Bräuhaus, U. Schröder, U. Böttger, Appl. Phys. Lett. 99, 102903 (2011)10.1063/1.3634052 ↗
2. J. Lyu, I. Fina, J. Fontcuberta, F. Sanchez, ACS Appl. Mater. Interfaces. 11, 6224–6229 (2019)10.1021/acsami.8b18762 ↗
3. J. Müller, P. Polakowski, S. Mueller, T. Mikolajick, Ecs J. Solid State Sc. 4(5), N30–N35 (2015)
4. S.S. Cheema, D. Kwon, N. Shanker, R. dos Reis, S.-L. Hsu, J. Xiao, H. Zhang, R. Wagner, A. Datar, M.R. McCarter, C.R. Serrao, A.K. Yadav, G. Karbasian, C.-H. Hsu, A.J. Tan, L.-C. Wang, V. Thakare, X. Zhang, A. Mehta, E. Karapetrova, R.V. Chopdekar, P. Shafer, E. Arenholz, C. Hu, R. Proksch, R. Ramesh, J. Ciston, S. Salahuddin, Nature. 580, 478–482 (2020)10.1038/s41586-020-2208-x ↗
5. H. Lee, M. Lee, K. Lee, J. Jo, H. Yang, Y. Kim, S.C. Chae, U. Waghmare, J.H. Lee, Science. 369, 1343–1347 (2020)10.1126/science.aba0067 ↗
6. J.Y. Kim, M.-J. Choi, H.W. Jang, APL Mater. 9, 021102 (2021)10.1063/5.0035515 ↗
7. S. Yu, J. Hur, Y.-C. Luo, W. Shim, G. Choe, P. Wang, Semicond. Sci. Technol. 36, 104001 (2021)10.1088/1361-6641/ac1b11 ↗
8. J.Y. Park, K. Yang, D.H. Lee, S.H. Kim, Y. Lee, P.R.S. Reddy, J.L. Jones, M.H. Park, J. Appl. Phys. 128, 240904 (2020)10.1063/5.0035542 ↗
9. H.Y. Yoong, H. Wu, J. Zhao, H. Wang, R. Guo, J. Xiao, B. Zhang, P. Yang, S.J. Pennycook, N. Deng, X. Yan, J. Chen, Adv. Funct. Mater. 28, 1806037 (2018)10.1002/adfm.201806037 ↗
10. R. Meyer, R. Waser, K. Prume, T. Schmitz, S. Tiedke, Appl. Phys. Lett. 86, 142907 (2005)10.1063/1.1897425 ↗
11. M. Ghoneim, M. Zidan, M. Alnassar, A. Hanna, J. Kosel, K. Salama, M. Hussain, Adv. Electron. Mater. 1, 1500045 (2015)10.1002/aelm.201500045 ↗
12. G. Wolten, J. Am. Ceram. Soc. 46, 418 (1963)10.1111/j.1151-2916.1963.tb11768.x ↗
13. J. Müller, T.S. Böscke, U. Schröder, S. Mueller, D. Bräuhaus, U. Böttger, L. Frey, T. Mikolajick, Nano Lett. 12, 4318–4323 (2012)10.1021/nl302049k ↗
14. T. Shiraishi, K. Katayama, T. Yokouchi, T. Shimizu, T. Oikawa, O. Sakata, H. Uchida, Y. Imai, T. Kiguchi, T. Konno, H. Funakubo, Appl. Phys. Lett. 108, 262904 (2016)10.1063/1.4954942 ↗
15. R. Batra, T.D. Huan, J.L. Jones, G. Rossetti, R. Ramprasad, J. Phys. Chem. C 121, 4139–4145 (2017)10.1021/acs.jpcc.6b11972 ↗
16. Y. Wei, P. Nukala, M. Salverda, S. Matzen, H.J. Zhao, J. Momand, A.S. Everhardt, G. Agnus, G.R. Blake, P. Lecoeur, B.J. Kooi, J. Iniguez, B. Dkhil, B. Noheda, Nat. Mater. 17, 1095–1100 (2018)10.1038/s41563-018-0196-0 ↗
17. T. Shimizu, K. Katayama, T. Kiguchi, A. Akama, T.J. Konno, O. Sakata, H Funakubo Sci. Rep. 6, 32931 (2016)10.1038/srep32931 ↗
18. S. Starschich, T. Schenk, U. Schroeder, U. Boettger, Appl. Phys. Lett. 110, 182905 (2017)10.1063/1.4983031 ↗
19. S.J. Kim, J. Mohan, S.R. Summerfelt, J. Kim, JOM. 71, 246–255 (2018)10.1007/s11837-018-3140-5 ↗
20. M. Hyuk Park, H. Joon Kim, Y. Jin Kim, W. Lee, T. Moon, C.S. Hwang, Appl. Phys. Lett. 102, 242905 (2013)10.1063/1.4811483 ↗
21. J. Bouaziz, P. Rojo Romeo, N. Baboux, R. Negrea, L. Pintilie, B. Vilquin, APL Mater. 7, 081109 (2019)10.1063/1.5110894 ↗
22. I. Fina, F. Sánchez, ACS Appl. Electron. Mater. 3, 1530– 1549 (2021)10.1021/acsaelm.1c00110 ↗
23. J. Lyu, I. Fina, R. Solanas, J. Fontcuberta, F. Sánchez, ACS Appl. Electron. Mater. 1, 220–228 (2019)10.1021/acsaelm.8b00065 ↗
24. A. Chouprik, D. Negrov, E.Y. Tsymbal, A. Zenkevich, Nanoscale. 13, 11635–11678 (2021)10.1039/D1NR01260F ↗
25. J. Lyu, I. Fina, F. Sánchez, Appl. Phys. Lett. 117, 072901 (2020)10.1063/5.0017738 ↗
26. J. Lyu, T. Song, I. Fina, F. Sánchez, Nanoscale. 12, 11280–11287 (2020)10.1039/D0NR02204G ↗
27. S. Estandía, J. Gàzquez, M. Varela, N. Dix, M. Qian, R. Solanas, I. Fina, F. Sánchez, J. Mater. Chem. C 9, 3486 (2021)10.1039/D0TC05853J ↗
28. S. Estandía, T. Cao, R. Mishra, I. Fina, F. Sánchez, J. Gazquez, Phys. Rev. Mater. 5, 074410 (2021)10.1103/PhysRevMaterials.5.074410 ↗
29. S. Estandía, N. Dix, J. Gazquez, I. Fina, J. Lyu, M.F. Chisholm, J. Fontcuberta, F. Sánchez, ACS Appl. Electron. Mater. 1, 1449–1457 (2019)10.1021/acsaelm.9b00256 ↗
30. J. Lyu, I. Fina, R. Solanas, J. Fontcuberta, F. Sánchez, Appl. Phys. Lett. 113, 082902 (2018)10.1063/1.5041715 ↗
31. T. Song, H. Tan, S. Estandia, J. Gazquez, M. Gich, N. Dix, I. Fina, F. Sanchez, Nanoscale. 14, 2337 (2022)10.1039/D1NR06983G ↗
32. P. Jiao, J. Li, Z. Xi, X. Zhang, J. Wang, Y. Yang, Y. Deng, D. Wu, Appl. Phys. Lett. 119, 252901 (2021)10.1063/5.0075391 ↗
33. T. Song, S. Estandía, N. Dix, J. Gàzquez, M. Gich, I. Fina, F. Sánchez, J. Mater. Chem. C 10, 8407 (2022)10.1039/D2TC00996J ↗
34. S. Liu, B M Hanrahan Phys. Rev. Mater. 3, 054404 (2019)
35. S. Estandía, N. Dix, M.F. Chisholm, I. Fina, F. Sánchez, Cryst. Growth Des. 20, 3801–3806 (2020)10.1021/acs.cgd.0c00095 ↗
36. J.Y. Jo, Y.S. Kim, T.W. Noh, J.-G. Yoon, T.K. Song, Appl. Phys. Lett. 89, 232909 (2006)10.1063/1.2402238 ↗
37. M.H. Park, H.J. Kim, Y.J. Kim, W. Lee, T. Moon, C.S. Hwang, Appl. Phys. Lett. 102, 242905 (2013)10.1063/1.4811483 ↗
38. T. Song, H. Tan, R. Bachelet, G. Saint-Girons, I. Fina, F. Sánchez, ACS Appl. Electron. Mater. 3, 4809 (2021)10.1021/acsaelm.1c00672 ↗
39. T. Song, R. Bachelet, G. Saint-Girons, N. Dix, I. Fina, F. Sánchez, J. Mater. Chem. C 9, 12224 (2021)10.1039/D1TC02512K ↗
40. P. Jiao, H. Cheng, J. Li, H. Chen, Z. Liu, Z. Xi, W. Ding, X. Ma, J. Wang, N. Zheng, Y. Nie, Y. Deng, L. Bellaiche, Y. Yang, D. Wu, Appl. Phys. Rev. 10, 031417 (2023)10.1063/5.0144958 ↗
41. U. Schroeder, C. Richter, M.H. Park, T. Schenk, M. Pešić, M. Hoffmann, F.P.G. Fengler, D. Pohl, B. Rellinghaus, C. Zhou, C. Chung, J.L. Jones, T. Mikolajick. Inorg. Chem. 57, 2752– 2765 (2018)10.1021/acs.inorgchem.7b03149 ↗
42. S. Einfeldt, V. Kirchner, H. Heinke, M. Dießelberg, S. Figge, K. Vogeler, D Hommel J. Appl. Phys. 88, 7029–7036 (2000)10.1063/1.1326852 ↗
43. P. Nukala, Y. Wei, V. Haas, Q. Guo, J. Antoja-Lleonart, B. Noheda, Ferroelectrics. 569, 148–163 (2020)10.1080/00150193.2020.1791658 ↗
44. M.M.J. Treacy, Microsc Microanal. 17, 847–858 (2011)10.1017/S1431927611012074 ↗
45. J. Steffesa, R. Ristaub, R. Ramesh, B. Huey, PNAS. 116, 2413 (2019)10.1073/pnas.1806074116 ↗
46. H. Kay, J. Dunn, Philos. Mag. 7, 2027 (1962)10.1080/14786436208214471 ↗
47. J. Mok Ok, S. Yoon, A.R. Lupini, P. Ganesh, A. Huon, M.F. Chisholm, Nyung Lee. ACS Appl. Mater. Interfaces. 13, 22059–22064 (2021)10.1021/acsami.1c04169 ↗
48. D. Lehninger, A. Prabhu, A. Sünbül, T. Ali, F. Schöne, T. Kämpfe, K. Biedermann, L. Roy, K. Seidel, M. Lederer, L.M. Eng, Adv. Phys. Res. 2, 2200108 (2023)10.1002/apxr.202200108 ↗
49. P. Buragohain, A. Erickson, T. Mimura, T. Shimizu, H. Funakubo, A. Gruverman, Adv. Funct. Mater. 32, 2108876 (2022)10.1002/adfm.202108876 ↗
50. Y. Wang, L. Tao, R. Guzman, Q. Luo, W. Zhou, Y. Yang, Y. Wei, Y. Liu, P. Jiang, Y. Chen, S. Lv, Y. Ding, W. Wei, T. Gong, Y. Wang, Q. Liu, S. Du, M Liu Sci. 381, 558–563 (2023)
51. A. Silva, I. Fina, F. Sánchez, J.P.B. Silva, L. Marques, V. Lenzi, Mat. Today Phys. 34, 1010642 (2023)