journal article·2025-04

Non-plane film and its growth mechanism by magnetron sputtering deposition on glass through via substrate

Xinyu Zhou, Xun Zhang, Songlin Liu, Jingyang Zhang, Zhilin Cao, Zhipeng Chang, Yingliang Tian, Ruzhi Wang

Applied Physics A· Volume 131· Issue 4
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Semiconductor materials and devices · Thin-Film Transistor Technologies · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (24)

Show source-provided references
1. H.R. Zhao, M.X. Chen, Sci. China-Technol. Sci. (2022). https://doi.org/10.1007/s11431-022-2119-310.1007/s11431-022-2119-3 ↗
2. Y.Y. Lai, K. Pan, Microelectron. Reliab. (2024). https://doi.org/10.1016/j.microrel.2024.11547710.1016/j.microrel.2024.115477 ↗
3. R.L. Puurunen, J. Appl. Phys. (2005). https://doi.org/10.1063/1.194072710.1063/1.1940727 ↗
4. M. Itoh, H. Iida, Appl. Sur. Sci. (2015). https://doi.org/10.1016/j.apsusc.2015.05.02310.1016/j.apsusc.2015.05.023 ↗
5. Z.D. Yin, S.S. Lin, J. Mater. Res. Technol-JMRT. (2023). https://doi.org/10.1016/j.jmrt.2023.06.24310.1016/j.jmrt.2023.06.243 ↗
6. Z.Y. Zhang, Y.T. Ding, IEEE Electron Device Lett. (2021). https://doi.org/10.1109/led.2021.310566710.1109/led.2021.3105667 ↗
7. S. Kilige, I. Bartusseck, Microelectron. Eng. (2019). https://doi.org/10.1016/j.mee.2018.11.00610.1016/j.mee.2018.11.006 ↗
8. L. Djomeni, T. Mourier, Microelectron. Eng. (2014). https://doi.org/10.1016/j.mee.2013.11.01010.1016/j.mee.2013.11.010 ↗
9. O. Lühn, C. van Hoof, Microelectron. Eng. (2008). https://doi.org/10.1016/j.mee.2008.06.00710.1016/j.mee.2008.06.007 ↗
10. T.W. Wei, J. Cai, Tsinghua Sci. Technol. (2014). https://doi.org/10.1109/tst.2014.678736810.1109/tst.2014.6787368 ↗
11. G. Zhu, Y.T. Yang, Molecules (2023). https://doi.org/10.3390/molecules2822766010.3390/molecules28227660 ↗
12. M. Evrard, S. Lucas, Surf. Coat. Technol. (2019). https://doi.org/10.1016/j.surfcoat.2019.12507010.1016/j.surfcoat.2019.125070 ↗
13. C. Ruan, X.M. Sun, Acta Phys. Sin. (2015). https://doi.org/10.7498/aps.64.03820110.7498/aps.64.038201 ↗
14. H.W. Ding, H. Shao, Micro Nano Elect. Intell. Manuf. (2021). https://doi.org/10.19816/j.cnki.10-1594/tn.2021.01.07510.19816/j.cnki.10-1594/tn.2021.01.075 ↗
15. X.Q. Wang, J. Zhao, Sur. Tech. (2022). https://doi.org/10.1649/j.cnki.issn.1001-3660.2022.02.01410.1649/j.cnki.issn.1001-3660.2022.02.014 ↗
16. Y.C. Fang, Principle and technology of vacuum coating, 1st end (Science Press, Beijing, 2014), pp.25–32
17. P. Sigmund, Phy. Rev. (1969). https://doi.org/10.1103/PhysRev.187.76810.1103/PhysRev.187.768 ↗
18. Y. Shu, Y. Zhang, Acta Phys. Sin. (2012). https://doi.org/10.7498/aps.61.01610810.7498/aps.61.016108 ↗
19. A.A. Istratov, C. Flink, Mater. Sci. Eng. B. (2000). https://doi.org/10.1016/S0921-5107(99)00514-010.1016/S0921-5107(99)00514-0 ↗
20. Y.P. Zhang, Fundamentals of surface science and thin film technology 1st end (Science Press, Beijing, 2022), pp.55–63
21. G. Zhu, G.W. Lu, J. Synth. Cryst. (2006). https://doi.org/10.16553/j.cnki.issn1000-985x.2006.01.00610.16553/j.cnki.issn1000-985x.2006.01.006 ↗
22. M. Huang, K.L. Liu, Acta Phys. Sin. (2012). https://doi.org/10.7498/aps.36.63010.7498/aps.36.630 ↗
23. M. Tsuchiya, K. Murakami, Jpn. J. Appl. Phys. (2016). https://doi.org/10.7567/jjap.55.06550210.7567/jjap.55.065502 ↗
24. O.A. Streletskiy, I.A. Zavidovskiy, Thin Solid Films. (2020). https://doi.org/10.1016/j.tsf.2020.13794810.1016/j.tsf.2020.137948 ↗