Modeling source–drain voltage-dependent energy needed for emission or absorption of a photon in GaN devices
Source abstract
Abstract
Based on the three-dimensional Schrödinger equation and hot-carrier effects, a physical model to clarify how the source–drain voltage affects the energy needed for the emission or absorption of a photon in GaN heterojunctions is proposed. The proposed model predicts that the energy needed for the emission or absorption of a photon in GaN heterojunctions will be linearly reduced by the square of the source–drain voltage and the device temperature. Thus, they will shift the emission or absorption spectrum of emission or absorption. The results of voltage and temperature-dependent spectrum noted in the Raman and photoluminescence experiments support the predicted results by the proposed model. Additionally, temperature-dependent spectral broadening observed in experiments can be described by the proposed model. It suggests that quantum coupling should be considered in GaN devices because of the hot-carrier effects, which denote that the energy of channel electrons can be very high. It is also essential for accurately measuring temperature by Raman measurement.
Source: expertdata · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: GaN-based semiconductor devices and materials · Advancements in Semiconductor Devices and Circuit Design · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (37)
Show source-provided references
1. R.K. Kaneriya, G. Rastogi, P.K. Basu, R.B. Upadhyay, A.N. Bhattacharya, Microelectron. Eng. 233, 111433 (2020).10.1016/j.mee.2020.111433 ↗
2. K.R. Bagnall, E.A. Moore, S.C. Badescu, L. Zhang, E.N. Wang, Rev. Sci. Instrum. 88, 113111 (2017).10.1063/1.5010225 ↗
3. J. Kim, J.A. Freitas, J. Mittereder, R. Fitch, B.S. Kang, S.J. Pearton, F. Ren, Solid-State Electron. 50, 408 (2006)10.1016/j.sse.2005.11.009 ↗
4. H. Rao, G. Bosman, Solid-State Electron. 79, 11 (2013)10.1016/j.sse.2012.06.014 ↗
5. T. Brazzini, M.A. Casbon, H.R. Sun, M.J. Uren, J. Lees, P.J. Tasker, H. Jung, H. Blanck, M. Kuball, Appl. Phys. Lett. 106, 213502 (2015).10.1063/1.4921848 ↗
6. M. Ťapajna, R.J.T. Simms, M. Faqir, M. Kuball, Y. Pei, U.K. Mishra, Presented at the 2010 IEEE International Reliability Physics Symposium, 2010 (unpublished).
7. Q. Hao, H.B. Zhao, Y. Xiao, M.B. Kronenfeld, Int. J. Heat Mass Transf. 116, 496 (2018)10.1016/j.ijheatmasstransfer.2017.09.048 ↗
8. I. Hwang, J. Kim, S. Chong, H.S. Choi, S.K. Hwang, J. Oh, J.K. Shin, U.I. Chung, IEEE Electron Device Lett. 34, 1494 (2013)10.1109/LED.2013.2286173 ↗
9. L.-F. Mao, H.-S. Ning, J.-Y. Wang, PLoS ONE 10, e0128438 (2015).10.1371/journal.pone.0128438 ↗
10. J. Kotani, J. Yaita, A. Yamada, N. Nakamura, K. Watanabe, J. Appl. Phys. 127, 234501 (2020).10.1063/1.5142696 ↗
11. L.F. Mao, IEEE Electron Device Lett. 28, 161 (2007)10.1109/LED.2006.889214 ↗
12. L.F. Mao, Appl. Phys. Lett. 90, 183511 (2007).10.1063/1.2735929 ↗
13. L.F. Mao, Appl. Phys. Lett. 91, 123519 (2007).10.1063/1.2789733 ↗
14. L.F. Mao, H. Ning, Z.L. Huo, J.Y. Wang, Sci. Rep. 5, 18307 (2015)10.1038/srep18307 ↗
15. L.F. Mao, H. Ning, C. Hu, Z. Lu, G. Wang, Sci. Rep. 6, 24777 (2016)10.1038/srep24777 ↗
16. S.M. Sze, K.K. Ng, Physics of Semiconductor Devices (Wiley, New Jersey, 2006).10.1002/0470068329 ↗
17. A. Rashmi, S. Kranti, R.S. Haldar, Gupta. Solid-State Electron. 46, 621 (2002)10.1016/S0038-1101(01)00332-X ↗
18. A. Loghmany, P. Valizadeh, J. Phys. D—Appl. Phys. 44, 125102 (2011).10.1088/0022-3727/44/12/125102 ↗
19. S. Rabbaa, J. Stiens, J. Phys. D—Appl. Phys. 44, 325103 (2011).10.1088/0022-3727/44/32/325103 ↗
20. A. Pais, Rev. Mod. Phys. 51, 863 (1979)10.1103/RevModPhys.51.863 ↗
21. V.K. Khanna, Extreme-Temperature and Harsh-Environment Electronics.
22. D.C. Look, D.K. Lorance, J.R. Sizelove, C.E. Stutz, K.R. Evans, D.W. Whitson, J. Appl. Phys. 71, 260 (1992)10.1063/1.350752 ↗
23. M.A. Huque, S.A. Eliza, T. Rahman, H.F. Huq, S.K. Islam, Solid-State Electron. 53, 341 (2009)10.1016/j.sse.2009.01.004 ↗
24. K.K. Young, IEEE Trans. Electron Devices 36, 399 (1989).10.1109/16.19942 ↗
25. S.H. Lee, Y.S. Yu, S.W. Hwang, D. Ahn, IEEE Trans. Nanotechnol. 8, 643 (2009)10.1109/TNANO.2009.2021654 ↗
26. T. Sawada, Y. Ito, K. Imai, K. Suzuki, H. Tomozawa, S. Sakai, Appl. Surf. Sci. 159–160, 449 (2000)10.1016/S0169-4332(00)00060-X ↗
27. A.S. Barker, M. Ilegems, Phys. Rev. B 7, 743 (1973)10.1103/PhysRevB.7.743 ↗
28. X.D. Wang, W.D. Hu, X.S. Chen, J.T. Xu, X.Y. Li, W. Lu, Opt. Quant. Electron. 42, 755 (2011)10.1007/s11082-011-9473-8 ↗
29. Y.I. Alivov, E.V. Kalinina, A.E. Cherenkov, D.C. Look, B.M. Ataev, A.K. Omaev, M.V. Chukichev, D.M. Bagnall, Appl. Phys. Lett. 83, 4719 (2003)10.1063/1.1632537 ↗
30. T.R. Lenka, A.K. Panda, Pramana 79, 151 (2012)10.1007/s12043-012-0290-9 ↗
31. Yu. Tsung-Hsing, K.F. Brennan, J. Appl. Phys. 89, 3827 (2001)10.1063/1.1352558 ↗
32. P. Rinke, M. Winkelnkemper, A. Qteish, D. Bimberg, J. Neugebauer, M. Scheffler, Phys. Rev. B 77, 075202 (2008).10.1103/PhysRevB.77.075202 ↗
33. S. Schöche, P. Kühne, T. Hofmann, M. Schubert, D. Nilsson, A. Kakanakova-Georgieva, E. Janzén, V. Darakchieva, Appl. Phys. Lett. 103, 212107 (2013).10.1063/1.4833195 ↗
34. D.J. As, A. Zado, Q.Y. Wei, T. Li, J.Y. Huang, F.A. Ponce, Japanese J. Appl. Phys. 52, 08JN04 (2013).10.7567/JJAP.52.08JN04 ↗
35. Y. Xu, H.-Q. Sun, Y.-N. Xiao, S.-Y. Han, F. Ke, presented at the Advances in Optoelectronics and Micro/nano-optics, 2010 (unpublished).
36. G. Abstreiter, K. Ploog, Phys. Rev. Lett. 42, 1308 (1979)10.1103/PhysRevLett.42.1308 ↗
37. A.J. Fischer, W. Shan, J.J. Song, Y.C. Chang, R. Horning, B. Goldenberg, Appl. Phys. Lett. 71, 1981 (1997)10.1063/1.119761 ↗